Applied Science and Convergence Technology

The Korean Vacuum Society (한국진공학회)
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Characterization of Al Doped ZnO Thin Films Prepared by RF Magnetron Sputtering Under Various Substrate Temperatures

  • Kim, Deok Kyu (Advanced Development Team, Samsung Electronics Co. Ltd.) ;
  • Kim, Hong Bae (Department of Semiconductor Engineering, Cheongju University)
  • Received : 2014.08.25
  • Accepted : 2014.09.26
  • Published : 2014.09.30
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Abstract

Al doped ZnO thin films have been deposited by a RF magnetron sputtering technique from a ZnO (2 wt.% $Al_2O_3$) target onto glass substrates heated at temperature ranging from RT to $400^{\circ}C$. X-ray diffraction analysis shows that the deposits have a preferential growth along the c-axis of a hexagonal structure. The full with at half maximum decreases from 0.45 to $0.43^{\circ}$ in the studied temperature range. The root main square surface roughness increases with substrate temperature from 1.89 to 2.67 nm. All films are transparent up to 80% in the visible wavelength range and the adsorption edge is red-shifted with substrate temperature from RT to $400^{\circ}C$. The sheet resistance increases from 92 ohm/sq to 419 ohm/sq when the deposition temperature increases from RT to $400^{\circ}C$. The increment of sheet resistance is caused by lowered carrier concentration resulting from an increase in surface roughness.

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References

  1. J. Muller, B. Rech, J. Springer, and M. Vanecek, Sol. Energy 77, 917 (2004). https://doi.org/10.1016/j.solener.2004.03.015
  2. T. Minami, S. Takata, and T. Kakumu, J. Vac. Sci. Technol. A 14, 1689 (1996). https://doi.org/10.1116/1.580320
  3. C. Guillen, and J. Herrero, Thin Solid Films 520, 1 (2011). https://doi.org/10.1016/j.tsf.2011.06.091
  4. J. Mass, P. Bhattacharya, R. S. Katiyar, Mater. Sci. Eng. B 103, 9 (2003). https://doi.org/10.1016/S0921-5107(03)00127-2
  5. J. Nomoto, T. Hirano, T. Miyata, and T. Minami, Thin Solid Films 520, 1400 (2011). https://doi.org/10.1016/j.tsf.2011.10.003
  6. H. Kumarakuru, D. Cherns, and G. M. Fuge, Surf. Coat. Technol. 205, 5083 (2011). https://doi.org/10.1016/j.surfcoat.2011.05.011
  7. D. J. Lee, H. M Kim, J. Y. Kwon, H. Choi, S. H. Kim, and K. B. Kim, Adv. Funct. Mater. 21, 448 (2011). https://doi.org/10.1002/adfm.201001342
  8. Z. Zhang, C. Bao, W. Yao, S. Ma, L. Zhang, and S. Hou, Superlattices Microstruct. 49, 644 (2011). https://doi.org/10.1016/j.spmi.2011.04.002
  9. A. I. Ali, A. H. Ammar, and A. Abdel Moez, Superlattices Microstruct. 65, 285 (2014). https://doi.org/10.1016/j.spmi.2013.11.007
  10. C. H. Ahn, S. Y. Lee, and H. K. Cho, Thin Solid Films 545, 106 (2013). https://doi.org/10.1016/j.tsf.2013.07.045
  11. J. H. Oha, K. K. Kim, and T. Y. Seong, Appl. Surf. Sci. 257, 2731 (2011). https://doi.org/10.1016/j.apsusc.2010.10.053
  12. Y. Igasaki and H. Saito, Thin Solid Films 199, 223 (1991). https://doi.org/10.1016/0040-6090(91)90004-H
  13. G. Haake, J. Appl. Phys. 47, 4086 (1976). https://doi.org/10.1063/1.323240

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