상압 플라즈마의 생성과 응용

  • Published : 2014.06.30

Abstract

Keywords

References

  1. V.I. Gibalov and G.J. Pietsch, J.Phys.D:Appl.Phys, 33, 2618 (2000)
  2. M. Simor, J. Rahel', P. Vojtek, M. Ernak, and A. Brablec, Appl.Phys.Lett , 81, 2716 (2002) https://doi.org/10.1063/1.1513185
  3. K.Y Lee, D.H Kim, H.J Lee, Trans. KIEE. 63, 80 (2014)
  4. F. Massines et al. J.Appl.Phys, 83, 2950 (1998) https://doi.org/10.1063/1.367051
  5. M. Teschke, J. Kedzierski, E.G. Finantu-Dinu, D. Korzec, and J. Engemann, IEEE Trans. Plasma Sci. 33, 310 (2005) https://doi.org/10.1109/TPS.2005.845377
  6. M.C. Kim, D.K Song, H.S Shin, S-H Baeg, G.S Kim, J-H. Boo, J.G Han, S.H Yang, Surface and Coatings Technology. 171, 312(2003) https://doi.org/10.1016/S0257-8972(03)00292-5
  7. X. Zhang, S. Ptasinska, J.Phys.D: Appl.Phys, 47, 145202 (2014) https://doi.org/10.1088/0022-3727/47/14/145202
  8. Q. Xiong, X.P. Lu, K. Ostrikov, Y. Xian, C. Zou, Z. Xiong and Y. Pan, Phys. Plasmas, 17, 043506 (2010) https://doi.org/10.1063/1.3381132
  9. J.L. Walsh, J.J. Shi, M.G. Kong, Appl.Phys.Lett. 88, 171501 (2006) https://doi.org/10.1063/1.2198100
  10. C.S. Ha, J.Y. Choi, D.H. Kim, C.H. Park, H.J. Lee, and H.J. Lee, Appl.Phys.Lett. 95, 061502 (2009) https://doi.org/10.1063/1.3194298
  11. I.E. Kieft, E. Pvd Laan, E. Stoffels, New J. Phys. 6, 149 (2004) https://doi.org/10.1088/1367-2630/6/1/149
  12. B. Lee, Y. Kusano, N. Kato, K. Naito, T.Horiuchi, H. Koinuma, Jpn.J.Appl.Phys . 36, 2888 (1997) https://doi.org/10.1143/JJAP.36.2888
  13. S.E. Babayan, J.Y. Jeong, A. Schutze, V.J. Tu, M. Moravej, G.S. Selwyn, R.F. Hick, Plasma Sources Sci. Technol, 10, 573 (2001) https://doi.org/10.1088/0963-0252/10/4/305
  14. E.A. Sosnin, E. Stoffels, M.V. Erofeev, I.E. Kieft, S.E. Kunts, IEEE Trans. Plasma Sci. 32, 1544 (2004) https://doi.org/10.1109/TPS.2004.833401
  15. J. Goree, B. Liu, D. Drake, E. Stoffels, IEEE Trans. Plasma Sci. 34, 1317 (2006) https://doi.org/10.1109/TPS.2006.878431
  16. E. Stoffels, A.J. Flikweert, W.W. Stoffels, G.M.W. Kroesen, Plasma Sources Sci.Technol. 11, 383 (2002) https://doi.org/10.1088/0963-0252/11/4/304
  17. I. Sardja, S.K. Dhali, Appl. Phys .Lett. 56, 21 (1989)
  18. . S. K. Dhali, I. Sardja, J. Appl. Phys. 69, 6319 (1991) https://doi.org/10.1063/1.348830