Membrane Journal (멤브레인)

The Membrane Society of Korea (한국막학회)
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Gas Permeation Characteristics of PTMSP-Silica Composite Membranes Using Sol-Gel Process

졸-겔법에 의한 PTMSP-Silica 복합막의 기체 투과 특성

  • Yoon, Sung-Hyon (Department of Industrial Chemistry, Sang Myung University) ;
  • Lee, Hyun-Kyung (Department of Industrial Chemistry, Sang Myung University)
  • Received : 2014.12.12
  • Accepted : 2014.12.29
  • Published : 2014.12.31
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Abstract

PTMSP-silica composite membranes were prepared by addition of 0, 15, 20, and 30 wt% TEOS (tetraethoxysilane), TMOS (tetramethoxysilane), MTMOS (methyltrimethoxysilane), and PTMOS (phenyltrimethoxysilane) contents to PTMSP using sol-gel process. The gas permeability of the composite membranes for $H_2$, $N_2$ and ideal selectivity for $H_2$ over $N_2$ were investigated as a function of alkoxysilane content. The permeabilities for $H_2$ and $N_2$ increased in the range of alkoxysilane contents 0~20 wt%, however decrease the range of 20~30 wt%. The ideal selectivities for $H_2$ over $N_2$ decreased in the range of TEOS and PTMOS contents 0~15 wt%, but increased in the range of 15~30 wt%. When compared to the upper bound of Robeson, PTMSP-silica composite membranes with TEOS content of 30 wt%, MTMOS content of 20 wt% and PTMOS content of 30 wt% turned out to be a simultaneous improvement in ideal selectivity and permeability.

PTMSP[Poly(1-trimethylsilyl-1-propyne)]에 TEOS (tetraethoxysilane), TMOS (tetramethoxysilane), MTMOS(methyltrimethoxysilane), 그리고 PTMOS (phenyltrimethoxysilane)의 함량을 0, 15, 20, 30 wt%로 달리하여 졸-겔법을 이용하여 PTMSP-silica 복합막을 제조하였다. PTMSP-silica 복합막의 알콕시실란 함량에 따른 $H_2$, $N_2$의 기체투과도와 $N_2$에 대한 $H_2$의 이상 선택도를 조사하였다. $H_2$와 $N_2$의 투과도는 알콕시실란 함량이 0~20 wt% 범위에서는 증가하다가 알콕시실란 함량이 20~30 wt% 범위에서는 감소하였다. $N_2$에 대한 $H_2$의 이상 선택도는 TEOS와 PTMOS의 함량이 0~15 wt% 범위에서는 감소하였으며, 15~30 wt% 범위에서는 다시 증가하였다. Robeson upper bound와 비교할 때, PTMSP-silica 복합막은 TEOS 함량이 30 wt%, MTMOS 함량이 20 wt% 그리고 PTMOS 함량이 30 wt%에서 투과도와 이상 선택도가 동시에 향상된 것으로 나타났다.

Keywords

References

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