References
- T. Osaka, M. Yoshino, Y. Nonaka, J. Sasano, I. Matsuda, Y. Shacham-Diamand, J. Electrochimica Acta, 51 (2005) 916. https://doi.org/10.1016/j.electacta.2005.04.069
- Y. Lantasov, R. Palmans, K. Maex, Microelectronic Engineering, 50(1-4) (2000) 441. https://doi.org/10.1016/S0167-9317(99)00313-5
- Z. Wang, R. Obata, H. Sakaue, T. Takahagi, S. Shingubara, Electrochemica Acta, 51(12) (2006) 2442. https://doi.org/10.1016/j.electacta.2005.07.023
- J. J. Kim, S. K. Cho, O. J. Kwon, Korean Chem. Eng. Res, 47(2) (2009) 141.
- J. J. Kim, S. K. Kim, Y. S. Kim, J. Vac. Sci. Technol, B21(1) (2003) 33.
- S. P. Chong, Y. C. Ee, Z. Chen, S.B. Law, Surf. Coat. Tech, 198(1-3) (2005) 287. https://doi.org/10.1016/j.surfcoat.2004.10.086
- K. J. Park, H. C. Koo, M. J. Kim, O. J. Kwon and J. J. Kim, J. Electrochem. Soc, 158(9) (2011) D541. https://doi.org/10.1149/1.3606532
- T. H. Lim, H. C. Koo, K. J. Park, M. J. Kim, S. K. Kim, J. J. Kim, J. Electrochem. Soc, 159(3) (2011) D142.
- A. Zhua, Y. Shacham-Diamand, M. Teoa, J. Solid State Chem. 179 (2006) 4056 https://doi.org/10.1016/j.jssc.2006.09.002
- S. Y. Chang, C. J. Hsu, R. H. Fang, S. J. Linz, J. Electrochem. Soc. 150 (2003) C603 https://doi.org/10.1149/1.1598212
- http://www.itrs.net/Links/2013ITRS/2013TableSummaries/2013ORTC_SummaryTable.pdf
- L. J. van der Pauw, Philips Res. Rep. 13 (1958) 1.
- F. Touyeras, J. Y. Hihn, S. Delalande, R. Viennet, M. L. Doche, Ultrason. Sonochem. 10 (2003) 363 https://doi.org/10.1016/S1350-4177(03)00098-1
- E. Steinhauser, Circuit World 36 (2010) 4 https://doi.org/10.1108/03056121011066279