한국진공학회지 (Journal of the Korean Vacuum Society)

한국진공학회 (The Korean Vacuum Society)
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DC 마그네트론 스퍼터링법에 의한 대면적 투명전도성 ZnO(Al)와 ZnO(AlGa) 박막제조 및 물리적 특성 연구

Fabrication and Study of Transparent Conductive Films ZnO(Al) and ZnO(AlGa) by DC Magnetron Sputtering

  • 손영호 ((주)유시스텍 기술연구소) ;
  • 최승훈 ((주)유시스텍 기술연구소) ;
  • 박중진 ((주)유시스텍 기술연구소) ;
  • 정명효 ((주)유시스텍 기술연구소) ;
  • 허영준 (경운대학교 신소재에너지학과) ;
  • 김인수 (경운대학교 신소재에너지학과)
  • Son, Young Ho (Technical Research Institute, Yusystech. Co., Ltd.) ;
  • Choi, Seung Hoon (Technical Research Institute, Yusystech. Co., Ltd.) ;
  • Park, Joong Jin (Technical Research Institute, Yusystech. Co., Ltd.) ;
  • Jung, Myoung Hyo (Technical Research Institute, Yusystech. Co., Ltd.) ;
  • Hur, Youngjune (Department of Material and Energy Engineering, Kyungwoon University) ;
  • Kim, In Soo (Department of Material and Energy Engineering, Kyungwoon University)
  • 투고 : 2013.03.07
  • 심사 : 2013.05.14
  • 발행 : 2013.05.30
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초록

In-line magnetron sputtering system을 사용하여 대면적($60{\times}60cm^2$) 소다라임 유리기판위에 투명전도성 ZnO(Al)와 ZnO(AlGa) 박막을 500 nm에서 1,450 nm까지 두께별로 증착하여 전기적, 광학적 특성을 연구하였다. XRD를 통해 c-축 방향성(002)을 가지고 성장된 것을 확인 하였다. Hall 특성 분석을 통해 이동도 및 캐리어 농도의 특성을 확인 하였으며, 그에 따른 ZnO(AlGa)의 비저항이 $9.03{\times}10^{-4}{\Omega}{\cdot}cm$에서 $7.83{\times}10^{-4}{\Omega}{\cdot}cm$으로 ZnO(Al) 보다 높게 나타났으며, 가시광선 영역에서 투과율은 87.6%에서 84.3%으로 나타났다. 따라서 ZnO(AlGa)는 전기적 특성이 우수하고 높은 투과율로 대면적용 투명전도성 재료로의 활용에 적합한 특성을 지닌 것을 확인 할 수 있었다.

In this study, we studied the properties of ZnO(Al) and ZnO(AlGa) thin film according to film thickness deposited on SLG by In-line magnetron sputtering system. XRD, FESEM, 4-point probe, Hall measurement system and UV/Vis-NIR spectrophotometer were employed to analyze the properties of ZnO(Al) and ZnO(AlGa) thin film. The all films exhibited (002) preferential orientation with clear peak shape and high intensity. The carrier concentration and Hall mobility of ZnO(Al) and ZnO(AlGa) thin film were improved with increasing thickness. The resistivity of both films decreased when the film thickness was raised from 500 nm to 1,450 nm. And then relatively the resistivity of ZnO(AlGa) film was lower than that of ZnO(Al) film. The transmittance of the films decreased with increasing film thickness but all films exhibited optical transmittances of over 83.3% in the visible region.

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피인용 문헌

  1. High-Throughput Continuous Hydrothermal Synthesis of Transparent Conducting Aluminum and Gallium Co-doped Zinc Oxides vol.19, pp.4, 2017, https://doi.org/10.1021/acscombsci.6b00118
  2. Optical and Electrical Properties of Sputtered Al Doped ZnO Thin Films with Various Working Pressure vol.22, pp.5, 2013, https://doi.org/10.5757/JKVS.2013.22.5.257