한국결정성장학회지 (Journal of the Korean Crystal Growth and Crystal Technology)

  • 제23권2호
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  • Pages.86-92
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  • 2013
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  • 1225-1429(pISSN)
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  • 2234-5078(eISSN)
한국결정성장학회 (The Korea Association of Crystal Growth)
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나노결정질 다이아몬드 seeding 효율 향상을 위한 silicon 표면 texturing

Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency

  • 박종천 (부산대학교 나노융합기술학과) ;
  • 정옥근 (부산대학교 나노융합기술학과) ;
  • 김상윤 (부산대학교 나노융합기술학과) ;
  • 박세진 (부산대학교 나노메카트로닉스공학과) ;
  • 윤영훈 (동신대학교 수소에너지학과) ;
  • 조현 (부산대학교 나노메카트로닉스공학과)
  • Park, Jong Cheon (Department of Nano Fusion Technology, Pusan National University) ;
  • Jeong, Ok Geun (Department of Nano Fusion Technology, Pusan National University) ;
  • Kim, Sang Youn (Department of Nano Fusion Technology, Pusan National University) ;
  • Park, Se Jin (Department of Nanomechatronics Engineering, Pusan National University) ;
  • Yun, Young-Hoon (Department of Hydrogen & Fuel Cell Technology, Dongshin University) ;
  • Cho, Hyun (Department of Nanomechatronics Engineering, Pusan National University)
  • 투고 : 2013.03.04
  • 심사 : 2013.04.12
  • 발행 : 2013.04.30
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초록

나노결정질 다이아몬드 박막 증착을 위한 전처리 공정으로 $SF_6/O_2$ 유도결합 플라즈마를 이용하여 Si 기판 표면을 texturing하였다. $SF_6/O_2$ 플라즈마 texturing은 2~16 범위의 매우 넓은 정규화된 표면 조도 선택성을 제공할 수 있음을 확인하였다. Texturing된 Si 기판 표면의 나노 다이아몬드 입자 seeding 이후 기존 기계적 연마 전처리에 비해 현저히 향상된 ${\sim}6.5{\times}10^{10}cm^{-2}$의 높은 핵형성 밀도를 확보하였다.

$SF_6/O_2$ inductively coupled plasmas were employed to texture Si surface as a pretreatment for nanocrystalline diamond film growth. It was found that the $SF_6/O_2$ plasma texturing provided a very wide process window where normalized roughness values in the range of 2~16 could be obtained. Significantly improved nucleation densities of ${\sim}6.5{\times}10^{10}cm^{-2}$ compared to conventional mechanical abrasion were achieved after seeding for the textured Si substrate.

키워드

참고문헌

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피인용 문헌

  1. Study of surface modification and contact angle by electrospun PVdF-HFP membrane with DLC coating vol.24, pp.1, 2014, https://doi.org/10.6111/JKCGCT.2014.24.1.033