반도체 제조용 CVD 및 Etcher 장비의 탄소배출량과 에너지 소비량 모니터링

Monitoring of the Carbon Emission and Energy Consumption of CVD and Etcher for Semiconductor Manufacturing

  • 고동국 (전북대학교 대학원 기계공학과) ;
  • 배성우 (전북대학교 대학원 기계설계공학과) ;
  • 김광선 (한국기술교육대학교 메카트로닉스공학부) ;
  • 임익태 (전북대학교 공과대학 기계설계공학부)
  • Ko, Dong Guk (Department of Mechanical Engineering, Graduate School, Chonbuk National University) ;
  • Bae, Sung Woo (Department of Mechanical Design Engineering, Graduate School, Chonbuk National University) ;
  • Kim, Kwang Sun (Department of Mechatronics Engineering, Korea University of Technology and Education) ;
  • Im, Ik-Tae (Department of Mechanical Design Engineering, College of Engineering, Chonbuk National University)
  • 투고 : 2013.08.21
  • 심사 : 2013.09.23
  • 발행 : 2013.09.30

초록

The purpose of this study is to develop a system that can monitor the amounts of energy consumption during CVD and etching process for semiconductor manufacturing. Specifically, this system is designed to measure the $CO_2$ emission amounts quantitatively by measuring the flow rate of gas used and amount of power consumed during the processes. The processes of CVD equipment can be classified generally into processing step and cleaning step and all the two steps were monitored. In CVD and etcher equipments, various gases including Ar and $O_2$ are used, but Ar, $O_2$ and He were monitored with the use of the LCI data of Korea Environmental Industry & Technology Institute and carbon emission coefficients of EcoInvent. As a result, it was found that the carbon emission amounts of CVD equipment for Ar, $O_2$ and He were $0.030kgCO_2/min$, $4.580{\times}10^{-3}kgCO_2/min$ and $6.817{\times}10^{-4}kgCO_2/min$, respectively and those of etcher equipment for Ar and $O_2$ are $5.111{\times}10^{-3}kgCO_2/min$ and $7.172kgCO_2/min$, respectively.

키워드

참고문헌

  1. Ko, Seung Jong, KSIA Activities in WSC ESH TF, Global GHG Regulatory & Technology Trend Seminar, Feb. 7. 2012, Conference Center COEX, Seoul Korea, pp.5-16, 2012.
  2. Lee, Min Young, The Greenhouse Gas Reduction Policy in Korea, Global GHG Regulatory & Technology Trend Seminar, Feb. 7. 2012, Conference Center COEX, Seoul Korea, pp. 17-32, 2012.
  3. SEMI S23-0708, Guide for Conservation of Energy, Utilities and Materials used by Semiconductor Manufacturing Equipment, SEMI, 2008.
  4. SEMI S23 Application Guide and Total Equivalent Energy (TEE) CalcII User's Guide, Technology Transfer #06094783D-ENG, Oct. 29. 2010, International SEMATECH Manufacturing Initiative, 2010.
  5. LabView is a name of the product of National Instrument Corporation, 11500 N Mopac Expwy Austin, TX 78759-3504, 2010.
  6. National LCI database network by Korea Environmental Industry & Technology Institute, http://edp.or.kr/lcidb/about/about_tinfo.asp.
  7. Ecoinvent, Swiss Center for Life Cycle Inventories, ESU-services, ifu Hamburg GmbH, 2000.