Journal of the Microelectronics and Packaging Society (마이크로전자및패키징학회지)

The Korean Microelectronics and Packaging Society (한국마이크로전자및패키징학회)
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The Study of Optical Device embedded Optical Alignment fabricated by Roll to Roll Process

롤투롤 공정을 이용한 광정렬 구조 내장형 광소자 연구

  • Jo, Sang-Uk (Department of Cogno-Mechatronics Engineering, Pusan National University) ;
  • Kang, Ho-Ju (Department of Cogno-Mechatronics Engineering, Pusan National University) ;
  • Jeong, Myung-Yung (Department of Cogno-Mechatronics Engineering, Pusan National University)
  • 조상욱 (부산대학교 인지메카트로닉스공학과) ;
  • 강호주 (부산대학교 인지메카트로닉스공학과) ;
  • 정명영 (부산대학교 인지메카트로닉스공학과)
  • Received : 2013.06.19
  • Accepted : 2013.07.08
  • Published : 2013.09.30
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Abstract

Recently, high speed transmission and large information demand have been increased. Also, researches of integrated optical device for large production and high-efficient planar lightwave circuit (PLC) have been increased. In this paper, integrated optical alignment is proposed which makes passive alignment between optical device and optical fiber possible. The integrated optical device consists of splitter structures which have one input and two outputs. The proposed integrated structure was fabricated by roll-to-roll (RTR) processing method. This method enables to manufacture continuously and the processing time can be shortened. Optical property of the fabricated optical device showed 3.9 dB insertion loss and 0.2 dB optical uniformity using the light source with 1550 nm wavelength.

고속, 대용량 정보 전송 수요가 급격하게 증가함에 따라 대량생산 및 고효율의 PLC형 집적 광소자의 연구가 증가하고 있다. 본 논문에서는 광소자와 광섬유가 수동 정렬이 가능하도록 일체형 정렬 구조를 제안하였다. 일체형 구조의 광소자는 기본적으로 1채널의 입력부의 광신호를 2채널의 출력부를 통해 분리하는 광분배기 구조이다. 본 연구에서 제안된 일체형 구조의 제작은 롤투롤 공정 기술을 이용하여 제작하고 그 특성을 평가하였다. 롤투롤 공정 기술은 광소자의 제작에 들어가는 시간을 절감하고 연속생산이 가능한 방법이다. 제작된 광소자의 광특성은 1550 nm의 광원을 이용하여 약3.9 dB의 삽입손실과 0.2 dB의 채널 균일도를 나타내었다.

Keywords

References

  1. J. H. Ryu, T. H. Lee, I. K. Cho, C. S. Kim and M. Y. Jeong, "Simple Fabrication of a Double-Layer Multi-Channel Optical Waveguide Using Passive Alignment", Opt. Express 19(2), 1183 (2011). https://doi.org/10.1364/OE.19.001183
  2. J. H. Ryu, P. J. Kim, C. S. Cho, E. H. Lee, C. S. Kim and M. Y. Jeong, "Optical Interconnection for a Polymeric PLC Device Using Simple Positional Alignment", Opt. Express 19(2), 8571 (2011). https://doi.org/10.1364/OE.19.008571
  3. D. M. Kim, J. H. Ryu and M. Y. Jeong, "Optical Packaging and Interconnection Technology", J. Microelectron. Packag. Soc., 19(4), 13 (2012). https://doi.org/10.6117/kmeps.2012.19.4.013
  4. S. Y. Chou, P. R. Krauss and P. J. Renstrom, "Nanoimprint Lithography", J. Vac. Sci. Technol. B, 14(6), 4129 (1996). https://doi.org/10.1116/1.588605
  5. K. Marua, Y. Fujii, S. Zhang and W. Hou. "Proposed Design for High Precision Refractive Index Sensor Using Integrated Planar Lightwave Circuit", Physics Procedia 2, 2(1), 39 (2009). https://doi.org/10.1016/j.phpro.2009.06.007
  6. J. A. Duan and Y. Zheng, "Experimental Study of the Packaging Failure for Optical Fiber Arrays", Advan. Mater. Res., 295-297, 1594 (2011). https://doi.org/10.4028/www.scientific.net/AMR.295-297.1594
  7. A. Bessonov, J. W. Seo, J. G. Kim, E. S. Hwang, J. W. Lee, J. W. Cho, D. J. Kim and S. W. Lee, "Control over Pattern Fidelity and Surface Wettability of Imprinted Templates for Flexible Color Filter Manufacturing", Microelectron. Eng., 88(9), 2913 (2011). https://doi.org/10.1016/j.mee.2011.03.157
  8. K. S. Chenab, K. S. Oua and Y. M. Liaoa, "On the Influence of Roller Misalignments on the Web Behavior during Rollto- Roll Processing", J. Chinese Inst. Eng., 34(1), 87 (2011). https://doi.org/10.1080/02533839.2011.552979
  9. S. H. Ahn and L. J. Guo, "High-Speed Roll-to-Roll Nanoimprint Lithography on Flexible Plastic Substrates", Advan. Mater., 20(11), 2044 (2008). https://doi.org/10.1002/adma.200702650
  10. J. Dumong, K. Ansari, C. Tan, S. Y. Yew and H. Y. Low, "Interfacial and Process Considerations in UV Roll-to-Roll Nanoimprinting at 50 nm Resolution: Elimination Legacy Coatings and Improving Manufacturability", Proc. 10th International Conference on Nanoimprint and Nanoprint Technology, Jeju, Korea Institute of Machinery & Materials (2011).
  11. N. W. Kim, K. W. Kim and H. C. Sin, "A Viscoelasitc Finite Element Analysis of Thermal Nanoimprint Lithography Process", J. Microelectron. Packag. Soc., 14(4), 1 (2007).

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