Scheduling Algorithms for Minimizing Total Weighted Flowtime in Photolithography Workstation of FAB

반도체 포토공정에서 총 가중작업흐름시간을 최소화하기 위한 스케쥴링 방법론에 관한 연구

  • Choi, Seong-Woo (Department of Business Administration, Kyonggi University)
  • Received : 2011.11.10
  • Accepted : 2012.02.08
  • Published : 2012.03.31

Abstract

This study focuses on the problem of scheduling wafer lots of several recipe(operation condition) types in the photolithography workstation in a semiconductor wafer fabrication facility, and sequence-dependent recipe set up times may be required at the photolithography machines. In addition, a lot is able to be operated at a machine when the reticle(mask) corresponding to the recipe type is set up in the photolithography machine. We suggest various heuristic algorithms, in which developed recipe selection rules and lot selection rules are used to generate reasonable schedules to minimizing the total weighted flowtime. Results of computational tests on randomly generated test problems show that the suggested algorithms outperform a scheduling method used in a real manufacturing system in terms of the total weighted flowtime of the wafer lots with ready times.

Keywords

References

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