Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Shape Optimization of a Permittivity Graded Solid Insulator in a Gas Insulated Switchgear

가스절연 개폐장치에서 유전율 구배를 갖는 고체 절연물의 형상 최적화

  • Ju, Heugn-Jin (Department of Electrical Engineering, Hanyang University) ;
  • Kim, Dong-Kyue (Department of Electronic Engineering, Hanyang University) ;
  • Ko, Kwang-Cheol (Department of Electrical Engineering, Hanyang University)
  • Received : 2012.04.04
  • Accepted : 2012.05.24
  • Published : 2012.06.01
Download PDF
⟨ Previous Next ⟩

Abstract

A functionally graded material (FGM) spacer, which the distribution of dielectric permittivity inside an insulator changes spatially, can considerably reduce the electric field concentration around a high-voltage electrode and along the gas-insulator interface when compared to a conventional spacer with a uniform permittivity distribution. In this research, we propose the FGM spacer with an elliptical permittivity distribution instead of that with a distribution of dielectric permittivity varying along a radial direction only in order to improve efficiently the insulation capability. The optimal design of the elliptical FGM spacer configuration is performed by using the response surface methodology (RSM) combined with the steepest descent method (SDM).

Keywords

References

  1. T. Rokunohe, Y. Yagihashi, F. Endo, and T. Oomori, EE Japan, 155, 9 (2006).
  2. J. Sato, O. Sakaguchi, and M. Miyagawa, Toshiba Report, 5, 66 (2003).
  3. S. K. Choi and K. H. Kim, J. KIEEME, 20, 374 (2007).
  4. J. K. Wesel, The Handbook of Advanced Materials: Enabling New Designs (Wiley Interscience, 2004)
  5. M. Kurimoto, K. Kato, M. Hanai, Y. Hoshina, M. Takei, and H. Okubo, IEEE Trans. Dielectr. Electr. Insul., 17, 256 (2010). https://doi.org/10.1109/TDEI.2010.5412025
  6. M. Kurimoto, K. Kato, M. Hanai, Y. Hoshina, M. Takei, and H. Okubo, IEEE Trans. Dielectr. Electr. Insul., 17, 256 (2010). https://doi.org/10.1109/TDEI.2010.5412025
  7. K. Kato, M. Kurimoto, H. Shumiya, H. Adachi, S. Sakuma, and H. Okubo, IEEE Trans. Dielectr. Electr. Insul., 123, 362 (2006).
  8. H. J. Ju, K. C. Ko, and S. K. Choi, J. Korean Phys. Society, 55, 1803 (2009). https://doi.org/10.3938/jkps.55.1803
  9. A. I. Khuri and J. A. Cornell, Response Surface Designs and Analyzes (Marcel Dekker, New York, 1996).