고분자 안경 렌즈의 재질별 화학적 식각 반응성 비교

Comparison of Properties of Polymer Based Glass Lenses by Chemical Etching Reaction

  • 이정화 (서울과학기술대학교 안경광학과) ;
  • 노혜란 (서울과학기술대학교 안경광학과)
  • Lee, Junghwa (Dept. of Optometry, Seoul National University of Science and Technology) ;
  • Noh, Hyeran (Dept. of Optometry, Seoul National University of Science and Technology)
  • 투고 : 2012.04.16
  • 심사 : 2012.06.16
  • 발행 : 2012.06.30

초록

목적: 안경 렌즈 코팅 막을 불화수소산을 이용하여 상온에서 단시간 화학적으로 식각한 뒤 코팅 막과 렌즈 원재료의 변화를 살펴보고자 하였다. 방법: GRAY 70%로 염색된 vinyl ester계 고분자(Lens A)와 thiourethane계 고분자렌즈(Lens B)를 불화수소산을 이용해 5분, 10분 또는 15분 동안 식각한 뒤 재료의 기계적 물성과 하드코팅과 반사방지코팅 등 코팅 막의 손상 정도, 그리고 굴절률 광투과율 등 렌즈의 특성 변화를 관찰하였다. 결과: 두 재료 모두 식각 전과 후의 굴절력에는 큰 변화가 없었지만 반사방지코팅과 하드코팅이 차례로 제거되었고 렌즈 표면에도 손상을 주어 UV 투과율이 증가되었으며 기계적 물성은 소하였다. 화학적 식각으로 인한 렌즈의 물성 변화는 thiourethane계 고분자 렌즈에서 더 크게 나타났다. 결론: 고분자 재료의 특성에 따라 불화수소산에 대한 반응성이 다르기 때문에 식각에 따른 렌즈 자체의 물성 변화가 다르게 나타남을 알 수 있었다.

Purpose: To study changes in coating and lens materials after chemically etched different polymer based glass lenses in short-term and ambient condition using hydrofluoric acid. Methods: Vinyl ester polymer (Lens A) and thiourethane polymer (Lens B), both dyed in gray 70%, were etched in hydrofluoric acid solution for 5, 10, or 15 min. The mechanical properties, degrees of damages in hard coating, anti-reflection coating, and other coatings, rates of refractive index and light transmission of both polymer types were evaluated. Results: Rates of refractive index of both lens types were not changed significantly after chemical etching. However, anti-reflection coatings and hard coatings were removed and lens surfaces were damaged. As a results, UV light transmission of lenses increased and mechanical properties decreased. Chemical etching notably changed various properties of thiourethane polymer materials. Conclusions: Depending on types of polymer materials, chemical reactions by hydrofluoric acid were dissimilar. Thus, various properties of les materials were altered differently.

키워드

참고문헌

  1. McCrum NG, Buckley CP, Bucknall CB. Principles of Polymer Engineering, 1st Ed. London: Oxford University Press, 1987;60-160.
  2. Graeme M, Ezio R, San HT. Radical addition-fragmentation chemistry in polymer synthesis. Polymer. 2008;49(5):1079-1131. https://doi.org/10.1016/j.polymer.2007.11.020
  3. Kim DS. Ophthalmic Materials, 1st Ed. Seoul: Bookshill, 2004;132-187.
  4. Pearton SJ, Abernathy CR, Ren F, Lothian JR, Wisk PW, Katz A. Dry and wet etching characteristics of InN, AlN, and GaN deposited by electron cyclotron resonance metalorganic molecular beam epitaxy. J of Vac Sci Tech A: Vacuum Surfaces and Films. 1993;11(4):1772-1775. https://doi.org/10.1116/1.578423
  5. Hsieh JT, Hwang JM, Hwang HL, Hung WH. Damagefree Photo-assisted Cryogenic Etching of GaN As-evidenced by Reduction of Yellow Luminescence. MRS Proceedings, 1998;537:G10.6.
  6. Youtsey C, Bulman G, Adesida I. Dopant-selective photoenhanced wet etching of GaN. J Electron Mater. 1998;27(4):282-287. https://doi.org/10.1007/s11664-998-0400-0
  7. Lee JD, Shin JS, Cho KT. The Characteristics of $SiO_2$ Film Etching to MERIE Plasma Etcher and High Density Plasma Etcher(ICP). J Ind Sci and Tech Institute. 2004;18(1):73-78.
  8. Moon BY, Hwang KJ, Lee YJ, Yu DS. Changes of the Plastic Lens Properties Caused by Etching of the Coating Films. J Korean Oph Opt Soc. 2010;15(1):55-60.
  9. William DC. Materials Science and Engineering: An Introduction, 7th Ed. New Jersey: Wiley, 2006;140-181.
  10. Yu DS, Moon BY, Ha JW. A Comparative study on test methods for ophthalmic lens Coatings. J Korean Oph Opt Soc. 2006;11(1):7-15.
  11. Li GZ, Wang L, Toghiani H, Daulton TL, Pittman CU. Viscoelastic and mechanical properties of vinyl ester (VE)/multifunctional polyhedral oligomeric silsesquioxane (POSS) nanocomposites and multifunctional POSS-styrene copolymers. Polymer. 2002;43(15):4167-4176. https://doi.org/10.1016/S0032-3861(02)00232-X
  12. Ziaee S, Palmese GR. Effects of temperature on cure kinetics and mechanical properties of vinyl-ester resins. J Polymer Science Part B: Polymer Physics. 1999;37(7):725-744. https://doi.org/10.1002/(SICI)1099-0488(19990401)37:7<725::AID-POLB23>3.0.CO;2-E
  13. Brown CW, Byers JD, Refvik MD. Thiourethane Compositions and Processes for Making and Using Same. U.S.A. Patent 20080214774, 2008.
  14. Kwon SI, Yang KJ, Song WC, Lim DG. Improvement of Etch Rate and Profile by $SF_6$, $C_4F_8$ and $O_2$ Gas Modulation. Journal of the Korean Institute of Electrical and Electronic Material Engineers. 2008;21(4):305-308. https://doi.org/10.4313/JKEM.2008.21.4.305