과제정보
연구 과제 주관 기관 : National Research Foundation
방사선산업학회지 (Journal of Radiation Industry)
- 제5권3호
- /
- Pages.243-247
- /
- 2011
- /
- 1976-2402(pISSN)
Fabrication of Poly(diallyldimethylammonium chloride) - Patterned Substrates for Patterning of Single Strand DNA Using Ion Implantation
- Ahn, Mi-Young (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Hwang, In-Tae (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Jung, Chan-Hee (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Choi, Jae-Hak (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Nho, Young-Chang (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute)
- 투고 : 2011.08.26
- 심사 : 2011.09.09
- 발행 : 2011.09.30
초록
In this study, a convenient method for the selective immobilization of single strand DNA (ssDNA) on a polymer surface was described. A positively charged polyelectrolyte, poly(diallyldimethylammonium chloride) (PDDA), was spin-coated on a tissue culture petridish and the micropatterns of the PDDA were formed by selective ion implantation through a pattern mask. The surface property of the implanted PDDA was investigated by using a surface profiler and FT-IR spectrometer. Cy3-labeled ssDNA was selectively immobilized on the PDDA patterns through ionic interaction and thus, well-defined ssDNA patterns were obtained.