Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Analysis of Electrical Characteristics of Low Temperature and High Temperature Poly Silicon TFTs(Thin Film Transistors) by Step Annealing

스텝 어닐링에 의한 저온 및 고온 n형 다결정 실리콘 박막 트랜지스터의 전기적 특성 분석

  • Lee, Jin-Min (Institute of Research and Development, ElnT.Co.,Ltd.)
  • Received : 2011.04.11
  • Accepted : 2011.05.19
  • Published : 2011.07.01
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Abstract

In this paper, experimental analyses have been performed to compare the electrical characteristics of n channel LT(low temperature) and HT(high temperature) poly-Si TFTs(polycrystalline silicon thin film transistors) on quartz substrate according to activated step annealing. The size of the particles step annealed at low temperature are bigger than high temperature poly-Si TFTs and measurements show that the electric characteristics those are transconductance, threshold voltage, electric effective mobility, on and off current of step annealed at LT poly-Si TFTs are high more than HT poly-Si TFT's. Especially we can estimated the defect in the activated grade poly crystalline silicon and the grain boundary of LT poly-Si TFT have more high than HT poly-Si TFT's due to high off electric current. Even though the size of particles of step annealed at low temperature, the electrical characteristics of LT poly-Si TFTs were investigated deterioration phenomena that is decrease on/off current ratio depend on high off current due to defects in active silicon layer.

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References

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