Comparison of Geometrical Factors of Dielectric Resonators Prepared for the Surface Resistance of Superconductor Films: Field Analysis vs. Computer Simulation

초전도체 박막의 표면저항 측정용 유전체 공진기에 대한 Geometrical factor의 비교 : 전자기장 해석 대 시뮬레이션

  • Yang, Woo-Il (Department of Physics and Center for Wireless Transmission Technology, Konkuk University) ;
  • Jung, Ho-Sang (Department of Physics and Center for Wireless Transmission Technology, Konkuk University) ;
  • Kim, Myung-Su (Department of Physics and Center for Wireless Transmission Technology, Konkuk University) ;
  • Cho, Man-Soon (Korea Atomic Energy Research Instititute) ;
  • Choo, Kee-Nam (Korea Atomic Energy Research Instititute) ;
  • Lee, Sang-Young (Department of Physics and Center for Wireless Transmission Technology, Konkuk University)
  • Received : 2011.11.30
  • Accepted : 2011.12.23
  • Published : 2011.12.31

Abstract

In the dielectric resonator method, which has been widely used for measuring the microwave surface resistance of superconductors, accuracies in the geometrical factors (G-factors) affect the uncertainty in the measured surface resistance. We compare the G-factors of short-ended sapphire resonator as obtained by using field analysis with those by using computer simulations: The former is obtained by using the analytic expressions for the electric and the magnetic field components inside the resonator, and the latter by using computer software. The G-factors as obtained by using the latter appear to be closer to those obtained by using the former as the resonator space is divided into larger number of sub-space, i.e., a tighter mesh, with a difference of ~8 % observed for a mesh of 14400 sub-spaces reduced to ~2 % for 114996 sub-spaces. Variations in the relative uncertainty in the surface resistance of typical $YBa_2Cu_3O_{7-\delta}$ superconductor films with those in the G-factors are studied, which provides an upper limit of the relative uncertainty in the G-factors required for realizing the target uncertainty in the surface resistance. These results could be useful in estimating the optimum number of meshes for obtaining the G-factors through computer simulations.

유전체 공진기법을 이용하여 초전도체 박막의 표면저항을 측정할 경우, 공진기의 $Q_U$로부터 초전도체 박막의 표면저항을 구하기 위해 알아야 하는 G-factor를 시뮬레이션과 전자기장 해석을 이용해서 구한 후 두 값을 비교하였다. 시뮬레이션 과정에서 사용된 mesh 수가 증가할수록 시뮬레이션으로 구한 G-factor의 크기와 전자기장 해석을 통해 얻은 값 간의 차이가 줄어들게 됨을 확인하였다. 공진기에 따라 mesh 수 증가에 따른 G-factor의 정확도 증가가 조금씩 다르게 나타났는데, 이는 공진기와 유전체의 크기에 따라 simulation program이 계산하는 개당 mesh의 크기가 각기 다르기 때문으로 여겨진다. 19.6 GHz의 공진주파수를 지닌 사파이어 공진기의 경우 시뮬레이션과 전자기장 해석을 통해 구한 G-factor의 차이를 이용하여 표면저항의 불확도 추정치를 온도의 함수로 구했으며 $Q_U$를 2 % 이내의 상대 불확도로 측정할 경우 G-factor의 불확도 변화에 따른 표면저항의 상대 불확도 변화를 확인하였다. 본 연구 결과는 전자기장 해석이 매우 어렵거나 불가능한 구조의 유전체 공진기 (예로서 open-ended 평행판 유전체 공진기)의 G-factor를 시뮬레이션을 이용하여 구하여 초전도체 박막의 표면저항을 $Q_U$로부터 측정하고자 할 때 측정 온도 구간에서 허용되는 표면저항의 불확도를 고려하여 G-factor의 시뮬레이션 시 사용되는 mesh 수가 결정되어야 함을 보여준다.

Keywords

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