Korean Journal of Metals and Materials (대한금속재료학회지)

The Korean Institute of Metals and Materials (대한금속재료학회)
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Coating Properties of a TPD Organic Hole-transporting Layer Deposited using a Continuous slot-die Coating Method

연속 slot-die 코팅법을 이용한 TPD 유기 정공수송층의 코팅 특성 분석

  • 정국채 (한국기계연구원 부설 재료연구소 나노기능분말연구그룹) ;
  • 김영국 (한국기계연구원 부설 재료연구소 나노기능분말연구그룹) ;
  • 최철진 (한국기계연구원 부설 재료연구소 나노기능분말연구그룹)
  • Received : 2009.10.17
  • Published : 2010.04.15
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Abstract

N,N'-diphenyl-N,N'-bis(3-methylphenyl)1-1' biphenyl-4,4'-diamine (TPD) hole-transporting layers were deposited using a continuous slot-die coating method on ITO/PET flexible substrates. It is crucial that the substrates have a very smooth surface with a RMS roughness of less than 2 nm for the deposition of semiconductor nanocrystals or Quantum Dots. The parameters of the slot-die coating, including the solution concentration of the TPD, the gap between the slot-die and the substrates, and the coating speed were controlled in these experiments. To obtain full coverage of the TPD films on the ITO/PET substrates (40 mm wide and several meters long), the injection rates of the TPD solution were increased proportional to the coating speed of the flexible substrates. Additionally, the injection rates must be increased as the gap distance changes from 400 to 600 ${\mu}m$ at the same coating speed. A RMS surface roughness of less than 2 nm was obtained, in contrast to bare ITO/PET substrates, at 13 nm, as the coating speed and gap distance increased.

Keywords

Acknowledgement

Supported by : 한국기계연구원

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