염산용액(鹽酸溶液)에서 Tri-Butyl Phosphate(TBP)에 의한 주석(朱錫)(IV)의 용매추출(溶媒抽出)

Solvent Extraction of Sn(IV) from Hydrochloric Acid Solution by Tri-Butyl Phosphate(TBP)

  • 서재성 (대진대학교 신소재공학과) ;
  • 안재우 (대진대학교 신소재공학과) ;
  • 이만승 (목포대학교 신소재공학과)
  • Seo, Jae-Seong (Dept. of Advanced Materials Science & Engineering, Daejin University) ;
  • Ahn, Jae-Woo (Dept. of Advanced Materials Science & Engineering, Daejin University) ;
  • Lee, Man-Seung (Dept. of Advanced Materials Science & Engineering, Mokpo National University)
  • 투고 : 2010.04.29
  • 심사 : 2010.06.11
  • 발행 : 2010.06.30

초록

염산용액으로부터 TBP(Tri-butyl Phosphate)를 사용하여 주석(IV)의 추출에 대한 기초연구를 실시하였다. 수용액상에서 염산과 염소이온($Cl^-$) 농도, 주석 농도 및 추출제 농도 등과 같은 실험인자들이 주석의 추출에 미치는 영향을 조사하였다. 염산과 염소이온 농도가 증가할수록 주석의 추출율이 증가하였고, 7.0M의 염산농도에서 10% TBP에 의해 주석이 98%이상 추출되었다. McCabe-thiele 도표 분석을 통해 주석의 연속 추출에 필요한 이론적인 최적 추출단수를 구하였다. 한편 탈거액으로 NaOH 용액이 효과적이었고, 2.0M NaOH 에서 99.3%이상의 높은 탈거율을 나타냈다.

Solvent extraction behavior of Sn(IV) from hydrochloric acid solution was investigated using TBP(Tri-butyl Phosphate) as an extractant. The experimental parameters, such as the concentration of HCl solution, chloride ions, extractant, and Sn were observed. Experimental results showed that the extraction percent of Sn was increased with increasing the hydrochloric acid and chloride ion concentration. More than 98% of Sn was extracted in 7.0 M HCl by 10% TBP. The optimum extraction stages of Sn for continuous extraction process was theoretically calculated by analysizing the McCabe-Thiele diagram. Stripping of Sn from the loaded organic phases can be accomplished by NaOH as a stripping reagent effectively and 99.3% of Sn was stripped by 2.0M NaOH solution.

키워드

참고문헌

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