전자빔 패터닝과 double-angle 그림자 증착법을 이용한 sub-micron 크기의 $Al-AlO_x-Al$ 터널접합 제작공정개발

Fabrication of Sub-Micron Size $Al-AlO_x-Al$ Tunnel Junction using Electron-Beam Lithography and Double-Angle Shadow Evaporation Technique

  • Rehmana, M. (Korea Research Institute of Standards and Science) ;
  • Choi, J.W. (Department of Physics, KAIST) ;
  • Ryu, S.J. (Department of Physics, KAIST) ;
  • Park, J.H. (Korea Research Institute of Standards and Science) ;
  • Ryu, S.W. (Department of Physics, Chonnam National University) ;
  • Khim, Z.G. (Department of Physics, Seoul National University) ;
  • Song, W. (Korea Research Institute of Standards and Science) ;
  • Chong, Y. (Korea Research Institute of Standards and Science)
  • 발행 : 2009.04.30

초록

We report our development of the fabrication process of sub-micron scale $Al-AlO_x-Al$ tunnel junction by using electron-beam lithography and double-angle shadow evaporation technique. We used double-layer resist to construct a suspended bridge structure, and double-angle electron-beam evaporation to form a sub-micron scale overlapped junction. We adopted an e-beam insensitive resist as a bottom sacrificing layer. Tunnel barrier was formed by oxidation of the bottom aluminum layer between the bottom and top electrode deposition, which was done in a separate load-lock chamber. The junction resistance is designed and controlled to be 50 $\Omega$ to match the impedance of the transmission line. The junctions will be used in the broadband shot noise thermometry experiment, which will serve as a link between the electrical unit and the thermodynamic unit.

키워드

참고문헌

  1. M. Gurvitch, M. A. Washington, H. A. Huggins, Appl. Phys. Lett. 42, 472 (1983). https://doi.org/10.1063/1.93974
  2. W. F. Brinkman, R. C. Dynes, J. M. Rowell, J. Appl. Phys. 41, 1915 (1970). https://doi.org/10.1063/1.1659141
  3. H. Grabert and M. H. Devoret, Eds., Single Charege Tunneling, Plenum Press, London (1991).
  4. L. Spietz, K. W. Lehnert, I. Siddiqi, R. J. Schoelkopf, Science 300, 1929 (1999).
  5. LOR and PMGI Resists datasheet, Microchem.
  6. G. J. Dolan, Appl. Phys. Lett. 31, 337 (1977). https://doi.org/10.1063/1.89690