Clean Technology (청정기술)

The Korean Society of Clean Technology (한국청정기술학회)
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Manufacture Technology of Monoammonium phosphate from LCD Waste Acid

LCD 제조공정의 혼합폐산으로부터 일인산암모늄 제조 기술

  • Lee, Ha-Young (Environment Research Department, Research Institute of Industrial Science & Technology) ;
  • Lee, Sang-Gil (Environment Research Department, Research Institute of Industrial Science & Technology) ;
  • Park, Sung-Kook (Environment Research Department, Research Institute of Industrial Science & Technology) ;
  • Kim, Ju-Han (NIT Co., Ltd.) ;
  • Kim, Ju-Yup (NIT Co., Ltd.) ;
  • Kim, Jun-Young (NIT Co., Ltd.)
  • Published : 2009.12.31
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Abstract

The waste solution discharged form the LCD(Liquid Crystal Display) manufacturing process contains phosphoric acid, nitric acid, acetic acid and metal ions such Al and other impurities. In this study, vacuum evaporation and diffusion dialysis was developed to commercialize an efficient system for recovering the high-purity phosphoric acid and manufacturing monoammonium phosphate. By vacuum evaporation, almost 99% of nitric and acetic acid was removed. Also, by diffusion dialysis, about 97.5% of Al was removed. Monoammonium phosphate was manufactured from purified phosphoric acid and ammonium hydroxide. In order to get the optimum manufacturing condition, the molar ratio of ammonium hydroxide and phosphoric acid, pH and temperature was controlled. Using this optimum condition, we obtained the recovery rate of monoammonium phosphate of about 90%.

LCD 제조공정에서 배출되는 질산과 초산, 인산, 그리고 Al과 같은 금속이온을 함유한 폐에칭액으로부터 진공증발과 확산투석을 이용하여 고순도 인산을 회수하여 인산암모늄을 제조하고자 하였다. 진공증발을 이용하여 질산과 초산을 제거하였다. 진공도가 -650 mmHg인 경우에는 온도 413 K 이상에서 완전 분리되었고, 진공도가 -700 mmHg인 경우에는 온도 393 K 이상의 영역에서 완전히 분리되었다. 그리고 진공도 -730 mmHg의 경우는 온도 383 K 이상에서도 완전 분리가 가능하였다. 99%의 질산과 초산을 제거하였으며, 확산투석을 이용하여 약 97.5% 이상의 Al을 제거하였다. 이렇게 얻어진 고순도 인산과 수산화암모늄을 이용하여 일인산암모늄을 제조하는 공정에서 급격한 발열반응을 제어하고 안정된 적정조건을 도출하기 위하여 수산화암모늄의 농도, 적정 몰비, pH, 온도 등의 반응인자를 조절하여 회수율 약 90%의 일인산암모늄을 제조하였다.

Keywords

References

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