Magnetic Properties of Al-Co-N Thin Films Dispersed with Co Particles

  • Han, Chang-Suk (Dept. of Defense Science & Technology, Hoseo University)
  • Received : 2007.12.03
  • Accepted : 2008.01.11
  • Published : 2008.01.31

Abstract

Al-Co-N thin films, Al-Co-N/Al-N and Al-Co-N/Al-Co multilayers containing various amounts of Co content were deposited by using a two-facing targets type dc sputtering (TFTS) system. The films were also annealed successively and isothermally at different annealing temperatures. Irrespective of Co content and preparation methods, all the as-deposited films were observed non-magnetized. It was found that annealing conditions can control the magnetic and electrical properties as well as the microstructure of the films.

Keywords

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