X선과 저에너지 전자선에 의한 DNA 손상

DNA Damage by X-ray and Low Energy Electron Beam Irradiation

  • 박연수 (충남대학교 물리학과) ;
  • 노형아 (충남대학교 물리학과) ;
  • 조혁 (충남대학교 물리학과) ;
  • ;
  • ;
  • ;
  • 발행 : 2008.06.30

초록

X선과 같은 고에너지 방사선에 의한 DNA 손상 중 간접적인 손상을 확인하기 위하여 탄탈륨(Ta) 박막위에 동결건조 과정으로 만들어진 pGEM-3Zf(-) plasmid DNA 단일층(monolayer)의 박막을 만든 다음, 에너지가 1.5 keV인 Al $K{\alpha}$ X선을 0분, 3분, 7분, 10분 동안 초고진공 상태에서 이 DNA 단일층에 조사하여 평균 흡수선량(mean absorbed dose)의 변화에 따른 DNA 손상을 관찰하였다. 또한 3 eV의 낮은 에너지 전자선을 조사하여 그 결과를 X선을 조사한 경우와 비교하였다. X선과 낮은 에너지 전자선으로 조사된 plasmid DNA를 전기영동(electrophoresis) 방법을 이용해 supercoiled DNA와 unsupercoiled DNA로 분리한 후 각각을 정량적으로 분석하였다. Supercoiled DNA는 X선과 3 eV 전자선의 조사에 따른 평균흡수선량이 증가함에 따라 선형적으로 감소했다. 그와 반대로 circular DNA와 crosslinked form 1 DNA는 평균흡수선량이 증가함에 따라 선형적으로 증가했다. 이것은 supercoiled DNA가 낮은 에너지 전자와 상호작용하여 외가닥 절단(single strand break)을 일으켰고 그 결과 unsupercoiled DNA로 변화되었음을 보여준다. 본 실험을 통해 X선과 같은 고에너지 방사선에 의한 DNA의 간접적 손상이 일어남을 관찰할 수 있었고, DNA의 이온화 에너지보다 작은 에너지($0{\sim}10\;eV$)를 갖는 전자에 의해서도 DNA 손상이 일어날 수 있음을 확인할 수 있었다.

We observed DNA damages as a function of mean absorbed dose to identify the indirect effect of high-energy radiation such as x-ray. Monolayer films of lyophilized pGEM-3Zf(-) plasmid DNA deposited on tantalum foils were exposed to Al $K{\alpha}$ X-ray (1.5 keV) for 0, 3, 7 and 10 min, respectively, in a condition of ultrahigh vacuum state. We compared DNA damages by X-ray irradiation with those by 3 eV electron irradiation. X-ray photons produced low-energy electrons (mainly below 20 eV) from the tantalum foils and DNA damage was induced chiefly by these electrons. For electron beam irradiation, DNA damage was directly caused by 3 eV electrons. Irradiated DNA was analyzed by agarose gel electrophoresis and quantified by ImagaQuant program. The quantities of remained supercoiled DNA after irradiation were linearly decreased as a function of mean absorbed dose. On the other hand, the yields of nicked circular (single strand break, SSB) and interduplex crosslinked form 1 DNA were linearly increased as a function of mean absorbed dose. From this study, it was confirmed that DNA damage was also induced by low energy electrons ($0{\sim}10\;eV$) even below threshold energies for the ionization of DNA.

키워드

참고문헌

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