반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)
- 제7권1호
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- Pages.29-34
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- 2008
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- 1738-2270(pISSN)
반응성 마그네트론 스퍼터링법에 의한 Nickel Oxide 박막 제작 특성에 관한 연구
Characteristics of Nickel Oxide Thin Film Manufactured by Reactive Magnetron Sputtering Method
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Kim, Gi-Bum
(Mechatronics Eng., Kumoh National Institute of Technology) ;
- Hwang, Yun-Sik (Mechatronics Eng., Kumoh National Institute of Technology) ;
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Kim, Yeung-Shik
(School of Mechanical Eng., Kumoh National Institute of Technology) ;
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Park, Jang-Sick
(World Vision Co.)
- 발행 : 2008.03.31
초록
In this paper, the DE(double erosion) cathode for the reactive magnetron sputtering system is developed for high deposition rate and high target utilization efficiency. The utilization efficiency of the developed DE cathode is 22% higher than that of normal SE(single erosion) cathode. Sputtering process for the nickel oxide thin films with the DE cathode is performed under the following conditions; power with
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