Journal of the Microelectronics and Packaging Society (마이크로전자및패키징학회지)
- Volume 15 Issue 4
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- Pages.25-29
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- 2008
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- 1226-9360(pISSN)
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- 2287-7525(eISSN)
Reliability of Multiple Oxides Integrated with thin $HfSiO_x$ gate Dielectric on Thick $SiO_2$ Layers
- Lee, Tae-Ho (Advanced Materials Research Center, The University of Texas at Austin) ;
- Lee, B.H. (SEMATECH) ;
- Kang, C.Y. (SEMATECH) ;
- Choi, R. (SEMATECH) ;
- Lee, Jack-C. (Advanced Materials Research Center, The University of Texas at Austin)
- Published : 2008.12.31
Abstract
Reliability and performance in metal gate/high-k device with multiple gate dielectrics were investigated. MOSFETs with a thin