Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Development of Micro Plasma Electrode using Focused Ion Beam

FIB를 이용한 마이크로 플라즈마 전극 개발

  • 최헌종 (한국생산기술연구원 나노가공팀) ;
  • 강은구 (한국생산기술연구원 나노가공팀) ;
  • 이석우 (한국생산기술연구원 나노가공팀) ;
  • 홍원표 (한국생산기술연구원 나노가공팀)
  • Published : 2005.05.01
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Abstract

The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. In this research, fabrication of micro plasma electrode was carried out using FIB. The one of problems of FIB-sputtering is the redeposition of material including Ga+ ion source during sputtering process. Therefore the effect of the redeposition was verified by EDX. And the micro plasma electrode of copper was fabricated by FIB.

Keywords

References

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