Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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A Study on Photocatalytic Degradation Properties by Oxygen Partial Pressure for Tio2Thin Films Fabricated by DC Magnetron Sputtering

DC 마그네트론 스퍼터링법으로 제조된 Tio2 박막의 산소분압비에 따른 광분해 특성에 관한 연구

  • Published : 2005.03.01
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Abstract

This paper describes the photocatalytic degradation properties by oxygen partial pressure for TiO$_2$ thin films fabricated by dc magnetron reactive sputtering. And the structural, chemical, optical and photocatalytic properties were investigated at various analysis system. When TiO$_2$ thin film was made at deposition time of 120 min and Ar:O$_2$ ratio of 60:40, the best properties were obtained. That results were as follows: thickness; 360∼370 nm, gram size; 40 nm, optical energy band gap; 3.4 eV and Benzene conversion in the photocatalytic degradation; 11 %.

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References

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