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Study on Depositing Oxide Films on Ni Substrate for Superconducting Tape

초전도 테이프 제작을 위한 니켈기판 상의 산화물 박막 증찰

  • 김호섭 (한국전기연구원 초전도재료연구그룹) ;
  • ;
  • 고락길 (한국전기연구원 초전도재료연구그룹) ;
  • 정준기 (한국전기연구원 초전도재료연구그룹) ;
  • 하홍수 (한국전기연구원 초전도재료연구그룹) ;
  • 송규정 (한국전기연구원 초전도재료연구그룹) ;
  • 박찬 (한국전기연구원 초전도재료연구그룹)
  • Published : 2004.12.01

Abstract

High temperature superconducting coated conductor has a structure of ///. The buffer layer consists of multi-layer, this study reports the deposition method and optimal deposition conditions of YSZ(Yttria-stabilized zirconia) layer which plays a important part in preventing the elements of substrate from diffusing into the superconducting layer. YSZ layer was deposited by DC reactive sputtering technique using water vapor for oxidizing deposited elements on substrate. To investigate optimal thickness of YSZ film, four YSZ/CeO$_2$/Ni samples with different YSZ thickness(130 nm, 260 nm, 390 nm, and 650 nm) were prepared. The SEM image showed that the surface of YSZ layer was getting to be rougher as YSZ layer was getting thicker and the growth mode of YSZ layer was columnar grain growth. After CeO$_2$ layer was deposited with the same thickness of 18.3 nm on each four samples, YBCO layer was deposited by PLD method with the thickness of 300 nm. The critical currents of four samples were 0, 6 A, 7.5 A, and 5 A respectively. This shows that as YSZ layer is getting thicker, YSZ layer plays a good role as a diffusion barrier but the surface of YSZ layer is getting rougher.

Keywords

References

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