Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Thermal Diffusion Process Modeling with Adaptive Finite Volume Method

적응성 유한체적법을 적용한 다차원 확산공정 모델링

  • 이준하 (상명대학교 컴퓨터시스템공학 정보디스플레이연구소) ;
  • 이흥주 (상명대학교 컴퓨터시스템공학 정보디스플레이연구소)
  • Published : 2004.09.01
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Abstract

This paper presents a 3-dimensional diffusion simulation with adaptive solution strategy. The developed diffusion simulator VLSIDIF-3 was designed to re-refine areas. Refine scheme was calculated by the difference of doping concentration between any of two nodes. Each element is greater than tolerance and redo diffusion process until error is tolerable. Numerical experiment in low doping diffusion problem showed that this adaptive solution strategy is very efficient in both memory and time, and expected this scheme would be more powerful in complex diffusion model.

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