References
- G. Aichmayr, D. Toet, M. Mulato, P.V. Santos, A. Spangenberg, S. Christiansen, M. Albrecht, and H. P. Strunk, 'Dynamics of lateral grain growth during the laser interference crystallization of a-Si,' Journal of Applied Physics, Vol. 85, No. 8, pp.4010-4013, April 1999 https://doi.org/10.1063/1.370305
- C. T. Angelis, C. A. Dimitriadis, M. Miyasaka, F. V. Farmakis, G. Kamarinos, J. Brini, and J. Stoemenos, 'Effect of excimer laser annealing on the structural and electrical properties of polycrystalline silicon thin-film transistors,' Journal of Applied Physics, Vol. 86, No. 8, pp. 4600-4606, October 1999 https://doi.org/10.1063/1.371409
- Byung-Hyuk Min, Chel-Min Park, and Min-Koo Han, 'Electrical characteristics of poly-Si TFT's with smooth surface roughness at oxide/poly-Si interface,' IEEE Transaction on Electron Device, Vol. 44, No. 11, pp. 2036-2038 https://doi.org/10.1109/16.641379
- Chun-Yen Chang, Hsiao-Yi Lin, Tan Fu Lei, Juing-Yi Cheng, Liang-Po Chen, Bau-Tong Dai, 'Fabrication of thin film transistors by chemical mechanical polished polycrystalline silicon films,' IEEE Electron Device Letters, Vol. 17, No. 3, pp. 100-102, March 1996 https://doi.org/10.1109/55.485180
- Noriyoshi Yamauchi, Rafael Rief, 'Polycrystalline silicon thin films processed with silicon ion implantation and subsequent solid-phase crystallization: Theory, experiments, and thin-film transistor applicatons,' Journal of Applied Physics, Vol. 75, No. 7, pp. 3235-3257, April 1994 https://doi.org/10.1063/1.356131
- J. Olivares, A. Rodri'guez, J. Sangrador, T. Rodri'guez, C. Ballesteros, and A. Kling, 'Solidphase crystallization of amorphous SiGe films deposited by LPCVD on SiO2 and glass,' Thin Solid Films, vol. 3, pp. 51-54, January 1999 https://doi.org/10.1016/0042-207X(53)93790-7
- G. Fortunato, 'Polycrystalline silicon thin-film transistors: A continuous evolving technology,' Thin Solid Films, vol. 4, pp. 82-90, March 1997 https://doi.org/10.1016/S0040-6090(96)09378-9
- T. Sameshima, 'Status of Si thin film transistors,' Journal of Non-Crystalline Solids, vol. 2, pp. 1196-1201, May 1998
- G. K. Guist, T. W. Sigmon, J. B. Boyce, and J. Ho, 'High-performance laser-processed polysilicon thin-film transistors,' IEEE Electron Device Letters, Vol. 20, No. 2, pp. 77-79, February 1999 https://doi.org/10.1109/55.740657
- T. Fujimura, A. Takami, A. Ishida, S. Kawamura, and T. Nishibe, LCD R&D Center, Toshiba, Toshiba Corporation, pp. 175-178, 19999