RE-PECVD법에 의해 증착된 DLC박막의 결합 특성

Bonding structure of the DLC films deposited by RE-PECVD

  • 최봉근 (CPRC, 한양대학교 세라믹공학과) ;
  • 신재혁 (산업자원부 기술표준원 광전재료과) ;
  • 안종일 (산업자원부 기술표준원 광전재료과) ;
  • 심광보 (CPRC, 한양대학교 세라믹공학과)
  • 발행 : 2004.02.01

초록

RF-PECVD 방법을 이용하여 DLC(diamond-like carbon)박막을 메탄-수소 가스 혼합비 및 바이어스 전압에 따라 실리콘 웨이퍼 위에 증착하였다. DLC 박막의 결합구조적 특성 및 기계적 성질은 FT-IR, Raman, 그리고 nano-indenter를 이용하여 평가하였다. 혼합가스내 메탄의 유량과 바이어스 전압이 증가함에 따라 증착속도가 증가하였다. 박막내 탄소의 $sp^3/sp^2$ 결합비와 경도는 반응가스내 수소의 유량 및 바이어스 전압이 증가함에 따라 증가하였다.

The diamond-like carbon (DLC) films were deposited on the Si (100) wafer by a rf-PECVD method as a function of the mixture rate of methane-hydrogen gas and bias voltage. The bonding structure and mechanical properties of these deposited DLC films were investigated using FT-IR, Raman, and nano-indenter. The deposition rates of DLC films increased with increased flow rate of methane in the gas mixtures and increased bias voltage. The $sp^3/sp^2$ bonding ratio of carbon in thin film and the hardness increased with increasing flow rate of hydrogen in the gas mixtures and increasing bias voltage.

키워드

참고문헌

  1. J. Appl. Phys. v.67 The properties of a-C:H films deposited by plasma decomposition of C₂H₂ J.W.Zou;K.Schmidt;K.Reichelt;B.Dischler https://doi.org/10.1063/1.345230
  2. J. Appl. Phys. v.61 Effects of heavy ion irradiation on amorphous hydrogenated (diamondlike) carbon films S.Prawer;R.Kalish;M.Adel;V.Richter https://doi.org/10.1063/1.338410
  3. J. Appl. Phys. v.59 Hard amorphous carbon studied by ellipsometry and photoluminescence J.Wagner;P.Lautenschlager https://doi.org/10.1063/1.336388
  4. Thin Solid Films v.212 Applications of diamond-like carbon films to electronic components H.Nakaue;T.Mitani;H.Kurokawa;Y.Yonezawa;H.Yoshino https://doi.org/10.1016/0040-6090(92)90527-I
  5. Vac. Sci. Technol. v.A6 Dense "diamondlike" hydrocarbons as random covalent networks J.C.Angus;F.Jansen
  6. Surf. Coat. Technol. v.100 Study of diamondlike carbon films for protective coatings V.Kh.Kudoyarova;A.V.Chemyshov;T.K.Zvonareva;N.B.Dzhelepova;M.B.Tsolov https://doi.org/10.1016/S0257-8972(97)00681-6
  7. Appl. Phys. Lett. v.58 Sputter deposition of dense diamond-like carbon films at low temperature Jerome J. Cuomo;James P. Doyle;John Bruley;Joyce C. Liu https://doi.org/10.1063/1.104609
  8. J. Appl. Phys. v.67 Amorphic diamond films produced by a laser plasma source F.Davanloo;E.M.Juengerman;D.R.Jander;T.J.Lee;C.B.Collins https://doi.org/10.1063/1.345566
  9. J. Vac. Sci. Technol. v.A10 Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma P.Reinke;S.Scheiz;W.Jacob;W.MOller
  10. J. Appl. Phys. v.65 The deposition and study of hard carbon films J.W.Zou;K.Reichelt;K.Schmidt;B.Dischler https://doi.org/10.1063/1.343355
  11. Vacuum v.46 Rf plasma properties of flat electrodes with multi-input terminals K.K.Hirakuri;N.Mutsukura;Y.Machi https://doi.org/10.1016/0042-207X(93)E0008-9
  12. J. Kor. Ceram. Soc. v.35 Evaluation of elastic properties of DLC films using substrate etching techniques S.J.Cho;K.R.Lee;K.Y.Eun;J.H.Hahn;D.H.Ko
  13. J. Appl. Phys. v.61 Inhomogeneous carbon bonding in hydrogenated amorphous carbon films A.Grill;B.S.Meyerson;V.V.Patel;J.A.Reimer;M.A.Petrich https://doi.org/10.1063/1.337883
  14. Mater. Sci. Eng. v.B46 Deposition of diamondlike carbon films by plasma enhanced chemical vapour deposition S.S.Choi;D.W.Kim;J.W.Joe;J.H.Moon;K.C.Park;J.Jang
  15. Surf. Coat. Technol. v.111 Thermal stability of diamond-like carbon films with added silicon W.J.Wu;M.H.Hon https://doi.org/10.1016/S0257-8972(98)00719-1
  16. Diam. Relat. Mater. v.9 Comparison of a-C:H films deposited from methane-argon and acetylene-argon mixtures by electron cyclotron resonance-chemical vapor deposition discharges B.K.Kim;T.Grotjohn https://doi.org/10.1016/S0925-9635(99)00186-7
  17. Thin Solid Films v.258 Nanotribological characterization of hydrogenated carbon films by scanning probe microscopy Z.Jiang;C.J.Lu;D.B.Bogy;C.S.Bhatia;T.Miyamoto https://doi.org/10.1016/0040-6090(94)06376-1
  18. Thin Solid Films v.270 Characterization of ion-beam-deposited diamond-like carbon films V.Palshin;E.I.Meletis;S.Ves;S.Logothetidis https://doi.org/10.1016/0040-6090(95)06912-7
  19. Phys. Rev. v.B41 Formation of hydrogenated amorphous carbon films of controlled hardness from a methane plasma G.J.Vandendentop;M.Kawasaki;R.M.Nix;I.G.Brown;M.Salmeron;G.A.Somorjai
  20. J. Phys. v.D23 X-ray photoelectron spectroscopy (XPS) of hydrogenated amorphous silicon carbide (a-$Si_{x}C_{1-x}$:H) prepared by the plasma CVD method A.Tabata;S.Fujii;Y.Suzuoki;T.Mizutani;M.Ieda
  21. Appl. Phys. v.A45 Diamond-like carbon films prepared by pulsed-laser evaporation T.Sato;S.Furuno;S.Iguchi;M.Hanaboss
  22. J. Vac. Sci. Technol. v.A5 Critical review characterization of diamondlike carbon films and their application as overcoats on thin-film media for magnetic recording H.Tsai;D.B.Bogy
  23. Phys. Rev. v.B41 Raman scattering and hydrogen-content analysis of amorphous hydrogenated carbon films irradiated with 200-KeV $C^+$ions L.A.Farrow;B.J.Wilkens;A.S.Gozdz;D.L.Hart
  24. Phys. Rev. v.B29 Use of Raman scattering to investigate disorder and crystallite formation in as-deposited and annealed carbon films R.O.Dillon;J.A.Woollam;V.Katkanant
  25. Phys. Rev. v.B30 Modeling studies of amorphous carbon D.beeman;J.Silverman;R.Lynds;M.R.Anderson
  26. Appl. Phys. Lett. v.58 Unhydrogenated diamond-like carbon films prepared by dc plasma chemical vapor deposition at room temperature Sunil Kumar https://doi.org/10.1063/1.105073
  27. Diam. Relat. Mater. v.9 Effect of microwave power on diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition S.F.Yoon;K.H.Tan;Rusli J. Ahn;Q.F.Huang https://doi.org/10.1016/S0925-9635(00)00360-5