Nickel Mesh for EMI Shielding by Continuous Electroforming

전주도금법에 의한 전자파 차폐용 Ni메쉬 제조기술

  • 김만 (한국기계연구원 표면연구부 전기화학응용그룹) ;
  • 권식철 (한국기계연구원 표면연구부 박막공정그룹) ;
  • 박상언 (한국기계연구원 표면연구부 전기화학응용그룹) ;
  • 이경렬 ((주)에프테크 사장)
  • Published : 2003.12.30

Abstract

Today, We have used many electronic equipment such as computer, TV, cellular phone and so on. These equipment radiate a large amount of EMI(Electromagnetic interference) which is occurred trouble of airplane, medical equipment, communicate equipment, and especially, human health. So, Ni mesh fabrication for EMI shielding by continuous electroforming process was investigated. Continuous electroforming apparatus was made by means of rotating cathode drum. And We investigated the characteristics of two types of Ni electroforming solution. One was made by laboratory and the other was produced by M cooperation. The grain size increased with increasing current density and bath temperature, and decreasing rotating speed of cathode drum. EDX results indicate that the Ni mesh electroformed by the KIMM solution is composed of pure Ni. But the Ni mesh electroformed by the M cooperation solution has Ni and S element. The incorporation of S element in the Ni mesh has a profoundly effect on mechanical properties such as hardness, internal stress and so on.

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