Progress in Novel Oxides for Gate Dielectrics and Surface Passivation of GaN/AlGaN Heterostructure Field Effect Transistors

  • Abernathy, C.R. (Department of Materials Science and Engineering, University of Florida) ;
  • Gila, B.P. (Department of Materials Science and Engineering, University of Florida) ;
  • Onstine, A.H. (Department of Materials Science and Engineering, University of Florida) ;
  • Pearton, S.J. (Department of Materials Science and Engineering, University of Florida) ;
  • Kim, Ji-Hyun (Department of Chemical Engineering, University of Florida) ;
  • Luo, B. (Department of Chemical Engineering, University of Florida) ;
  • Mehandru, R. (Department of Chemical Engineering, University of Florida) ;
  • Ren, F. (Department of Chemical Engineering, University of Florida) ;
  • Gillespie, J.K. (Air Force Research Laboratory Wright-Patterson Air Force Base) ;
  • Fitch, R.C. (Toyota Central Research and Development Laboratories, Inc.) ;
  • Seweel, J. ;
  • Dettmer, R. ;
  • Via, G.D. ;
  • Crespo, A. ;
  • Jenkins, T.J. ;
  • Irokawa, Y.
  • Published : 2003.03.01

Abstract

Both MgO and $Sc_2O_3$ are shown to provide low interface state densities (in the $10^{11}{\;}eV^{-1}{\;}cm{\;}^{-2}$ range)on n-and p-GaN, making them useful for gate dielectrics for metal-oxide semiconductor(MOS) devices and also as surface passivation layers to mitigate current collapse in GaN/AlGaN high electron mobility transistors(HEMTs).Clear evidence of inversion has been demonstrated in gate-controlled MOS p-GaN diodes using both types of oxide. Charge pumping measurements on diodes undergoing a high temperature implant activation anneal show a total surface state density of $~3{\;}{\times}{\;}10^{12}{\;}cm^{-2}$. On HEMT structures, both oxides provide effective passivation of surface states and these devices show improved output power. The MgO/GaN structures are also found to be quite radiation-resistant, making them attractive for satellite and terrestrial communication systems requiring a high tolerance to high energy(40MeV) protons.

Keywords

References

  1. N. X. Nguyen, M. Micovic, W.-S. Wong, P. Hashimoto, L.-M. McCray, P. Janke, C. Nguyen, Electron. Lett. 36, 468(2000) https://doi.org/10.1049/el:20000352
  2. Y. -F. Wu, B. P. Keller, S. Keller, D. Kapolnek, P. Kozodoy, S. P. DenBaars and U. K. Mishra, Solid-State Electron., 41, 1569(1997) https://doi.org/10.1016/S0038-1101(97)00106-8
  3. M. A. Khan, X. Hu, G. Simin, A. Lunev, J. Yang, R. Gaska, and M.S. Shur, IEEE Electron. Dev. Lett. 21, 63(2000) https://doi.org/10.1109/55.821668
  4. B. M. Green, K. K. Chu, E. M. Chumbes, J. A. Smart, J. R. Shealy, and L. F. Eastman, IEEE Electron. Dev. Lett., 21, 268(2000) https://doi.org/10.1109/55.843146
  5. S. C. Binari, W. Kruppa, H. B. Dietrich, G. Kelner, A. E. Wickenden and J. A. Freitas Jr, Solid-State Electron., 41, 1549(1997) https://doi.org/10.1016/S0038-1101(97)00103-2
  6. L. F. Eastman, V. Tilak, J Smart, B. M. Green, E. M. Chumbes, R. Dimitrov, H. Kim, O. S. Ambacher, N. Weimann, T. Prunty, M. Murphy, W. J. Scha, and J. R. Shealy, 'Undoped AlGaN/GaN HEMTs for microwave power amplification,' IEEE Trans. Electron Devices, vol. 48, no. 3, pp. 479-485, Mar. 2001 https://doi.org/10.1109/16.906439
  7. Y. -F. Wu, B. P. Keller, S. Keller, D. Kapolnek, P. Kozodoy, S. P. DenBaars and U. K. Mishra, Solid-State Electron., 41, 1569(1997) https://doi.org/10.1016/S0038-1101(97)00106-8
  8. J. W. Johnson, A.G. Baca, R. D. Briggs, R. J. Shul, C. Monier, F. Ren, S. J. Pearton, A. M. Dabiran, A. M. Wowchack, C. J. Polley and P. P. Chow, Solid-State Electron., 45, 1979(2001) https://doi.org/10.1016/S0038-1101(01)00255-6
  9. W. Lu, J. Yang, M. A. Khan and I. Adesida, IEEE Trans. Electron Dev., ED48, 581(2001) https://doi.org/10.1109/16.906454
  10. S. J. Pearton, J. C. Zolper, R. J. Shul, and F. Ren, 'GaN: processing, defects, and devices,' J Appl. Phys., vol. 86, pp. 1 - 78, 1999 https://doi.org/10.1063/1.371145
  11. G.Simin, X. Hu, N. Ilinskaya, A. Kumar, A. Koudymov, J. Zhang, M. Asif Khan, R. Gaska, M. S. Shur, Electron. Lett. 36, 2043(2000) https://doi.org/10.1049/el:20001401
  12. E. Kohn, I. Daumiller, P. Schmid, N. X. Nguyen, C. N. Nguyen, Electron. Lett. 35, 1022(1999) https://doi.org/10.1049/el:19990697
  13. J.-S. Lee; A. Vescan, A. Wieszt, R. Dietrich, H. Leier, Y.-S. Kwon, Electron. Lett. 37, 130(2001) https://doi.org/10.1049/el:20010100
  14. X. Hu, A. Koudymov, G. Simin, J. Yang, M. Asif Khan, A. Tarakji, M. S. Shur, and R. Gaska, Appl. Phys. Lett. 79, 2832(2001) https://doi.org/10.1063/1.1412591
  15. I. Daurniller, C. Kirchner, M. Karnp, K. J. Ebeling, and E. Kohn, 'Evaluation of the temperature stability of AlGaN/GaN heterostructure FET's,' IEEE Electron Device Lett., vol. 20, no. 9, pp. 448 - 450, Sep. 1999 https://doi.org/10.1109/55.784448
  16. A. Tarakji, G. Simin, N. Ilinskaya, X. Hu, A. Kumar, A. Koudymov, J. Yang, M. Asif Khan, M. S. Shur, and R. Gaska, Appl. Phys. Lett. 78, 2169(2001) https://doi.org/10.1063/1.1363694
  17. E. M. Chumbes, J. A. Smart, T. Prunty and J. M. Shealy, IEEE Trans. Electron Dev., 48, 416(2001) https://doi.org/10.1109/16.906429
  18. B. Luo, J. W. Johnson, F. Ren, K. K. Allums, C. R. Abernathy, S. J. Pearton, R. Dwivedi, T. N. Fogarty, R. Wilkins, A. M. Dabiran, A. M. Wowchack, C. J. Polley, P.P. Chow and A. G. Baca, Appl. Phys. Lett., 79, 2196 (2001) https://doi.org/10.1063/1.1408606
  19. S. J. Pearton, F. Ren, A. P. Zhang and K. P. Lee, Mat. Sci. Eng. Rep. R30, 55(2000)
  20. S. C. Binari, K. Ikossi, J. A. Roussos, W. Kruppa, D. Park; H. B. Dietrich, D. D. Koleske, A. E. Wickenden, and R. L. Henry, IEEE Trans. Electron Dev., 48,465(2001) https://doi.org/10.1109/16.906437
  21. G. Simin, A. Koudymov, A. Tarakji, X. Hu, J. Yang, M. Asif Khan, M. S. Shur, and R. Gaska, Appl. Phys. Lett. 79, 2651(2001) https://doi.org/10.1063/1.1412282
  22. F. Ren, M. Hong, S. N. G. Chu, M. A. Marcus, M. J. Schurman, A. Baca, S. J. Pearton, and C. R. Abernathy, Appl. Phys. Lett., 73, 3893(1998) https://doi.org/10.1063/1.122927
  23. J. W. Johnson, B. Luo, F. Ren, B. P. Gila, V. Krishnamoorthy, C. R. Abernathy, S. J. Pearton, J. I. Chyi, T. E. Nee, C. M. Lee, and C. C. Chuo, Appl. Phys. Lett., 77, 3230(2000) https://doi.org/10.1063/1.1326041
  24. B. P. Gila, J. W. Johnson, K. N. Lee, V. Krishnamoorthy, C. R. Abernathy, F. Ren, and S. J. Pearton, ECS Proc. Vol., 2001-1, 71(2001)
  25. M. Asif Khan, X. Hu, A. Tarakji, G. Simin, J. Yang, R. Gaska, and M. S. Shur, Appl. Phys. Lett. 77, 1339(2001) https://doi.org/10.1063/1.1290269
  26. G. Simin, X. Hu, N. Ilinskaya, J. Zhang, A. Tarakji, A. Kumar, J. Yang, M. Asif Khan, R. Gaska, M. S. Shur, IEEE Electron. Dev. Lett. 22, 53(2001) https://doi.org/10.1109/55.902829
  27. J. W. Johnson, B. P. Gila, B. Luo, K. P. Lee, C. R. Abernathy, S. J. Pearton, J. I. Chyi, T. E. Nee, C. M. Lee, C. Chou and F. Ren, J. Electrochem. Soc. G303(2001) https://doi.org/10.1149/1.1368110
  28. Hadis Morkoc, Aldo Di Carlo and Roberto Cingolani, Solid-State Electron. 46, 157(2002) https://doi.org/10.1016/S0038-1101(01)00271-4
  29. Y. Ohno, M. Kuzuhara, IEEE Trans. Electron Dev. ED48, 517(2001) https://doi.org/10.1109/16.906445
  30. Y.-F. Wu; D. Kapolnek, J. P. Ibbetson, P. Parikh, B. P. Keller, U. K. Mishra, IEEE Trans. Electron Dev. ED48, 586(2001) https://doi.org/10.1109/16.906455
  31. S. Arulkumaran, T. Egawa, H. Ishikawa, T. Jimbo, and M. Umeno, Appl. Phys. Lett. 73, 809(1998) https://doi.org/10.1063/1.122009
  32. I. Irokawa and Y. Nakano, Solid-State Electron. (In press)
  33. T. S. Lay, M. Hong, J. Kwo, J. P. Mannaerts, W. H. Hung and D. J. Huang, Solid-State Electron. 45, 1679(2001) https://doi.org/10.1016/S0038-1101(01)00175-7
  34. T. Hashizume, E. Alekseev, D. Pavlidis, K. S. Boutros, and J. Redwing, J. Appl. Phys. 88, 1983(2000) https://doi.org/10.1063/1.1303722
  35. N. Q. Zhang, S. Keller, G. Parish, S. Heikmann, S. P. DenBaars, and U. K. Mishra, 'High breakdown GaN HEMT with overlapping gate structure,' IEEE Electron Device Lett., vol. 21, pp. 421-423, Sept. 2000 https://doi.org/10.1109/55.863096
  36. B. P. Gila, J. Johnson, R. Mehandra, B. Luo, A. H. Onstine, K. K. Allums, V. Krishamoorthy, S. Bates, C. R. Abernathy, F. Ren, and S. J. Pearton, Phys. Stat. Solidi A188, 239(2001) https://doi.org/10.1002/1521-396X(200111)188:1<239::AID-PSSA239>3.0.CO;2-D
  37. P. B. Klein, S. C. Binari, K. Ikossi, A. E. Wickenden, D. D. Koleske, and R. L. Henry, Appl. Phys. Lett. 79, 3527 (2001) https://doi.org/10.1063/1.1418452
  38. B. Luo, J. W. Johnson, J. Kim, R. M. Mehandru, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, S. J. Pearton, A. G. Baca, R. D. Briggs, R. J. Shul, C. Monier, and J. Han, Appl. Phys. Lett. 80, 1661(2002) https://doi.org/10.1063/1.1455692
  39. R.Mehandru,B.P.Gila,J.Kim,J.W.Johnson,K.P.Lee,B. Luo,A.H.Onstine,C.R.Abernathy,S.J.Pearton and F.Ren, Electrochem.Solid-State Lett.5 G51(2002) https://doi.org/10.1149/1.1479298
  40. J.Kim,R.Mehandru,B.Luo,F.Ren,B.P.Gila,A.H.Onstine,C.R.Abernathy,S.J.Pearton and Y.Irokawa,Appl.Phys.Lett. 81 373(2002) https://doi.org/10.1063/1.1492852
  41. J.Kim,R.Mehandru,B.Luo,F.Ren,B.P.Gila,A.H.Onstine,C.R.Abernathy,S.J.Pearton and Y.Irokawa,Appl.Phys.Lett. 80 4555 (2002) https://doi.org/10.1063/1.1487903
  42. J.Kim,B.Gila,R.Mehandru,J.W.Johnson,J.H.Shin,K.P. Lee,B.Luo,A.Onstine,C.R.Abernathy,S.J.Pearton and F. Ren,J.Electrochem.Soc.149 G482(2002) https://doi.org/10.1149/1.1489689