Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Crystalline Properties of Carbon Nitride films According to Substrates and Growth Conditions

기판과 성장조건에 따른 질화탄소막의 결정성장 특성

  • 이지공 (경남대학교 전기전자공학부) ;
  • 이성필 (경남대학교 전기전자공학부)
  • Published : 2003.12.01
Download PDF
⟨ Previous Next ⟩

Abstract

Crystalline carbon nitride films have been deposited by RF reactive magnetron sputtering system with negative DC bias. The carbon nitride films deposited on various substrates showed ${\alpha}$- C$_3$N$_4$,${\beta}$-C$_3$N$_4$ and lonsdaleite structures through XRD and FTIR We can find the grain growth of hexagonal structure from SEMI photographs, which is coincident with the theoretical carbon nitride unit cell. When nitrogen gas ratio is 70 % and RF power is 200 W, the growth rate of carbon nitride film on quartz substrate is about 2.1 $\mu\textrm{m}$/hr.

Keywords

References

  1. Science v.245 Prediction of new low compressibility solids A.Y.Liu;M.L.Cohen https://doi.org/10.1126/science.245.4920.841
  2. Mater. Rcs. Innovations v.1 Inventory on innovative research : the case of $C_3N_4$ R.C.DeVries https://doi.org/10.1007/s100190050035
  3. Physical Review v.48 no.23 Calculated quasiparticle babd gap of $β-C_3N_4$ J.L.Corkill;M.L.Cohen https://doi.org/10.1103/PhysRevB.48.17622
  4. 센서학회지 v.9 no.3 페닝 소스 스퍼터링 장치를 이용한 결정성 질화탄소막의 성장 및 물리적 특성 이성필;.Shaestagir Chowdhury
  5. Diamond abd Related Materials v.8 On the validity of the formation of crystalling carbon nitrides, $C_3N_4$ S.Matsumoto;E.Q.Xie;F.Izumi https://doi.org/10.1016/S0925-9635(99)00103-X
  6. Materials Chemistry and Physics v.43 Carbon nitride and other speculative superhard materials C.M.Sung;M.Sung https://doi.org/10.1016/0254-0584(95)01607-V
  7. Diamond and Related Materials v.8 A review of the preparation of carbon nitride films S.Muhl;J.M.Mendez https://doi.org/10.1016/S0925-9635(99)00142-9
  8. Intcrnational Journal of Modern Physics B v.9 no.27 Synthesis of carbon mitride D.Marton;K.J.Boyd;J.W.Rabalais https://doi.org/10.1142/S0217979295001385
  9. Phys. Rev. B: Condens. Matter v.49 no.7 Observation of crystalline $C_3N_4$ K.M.Yu;M.L.Cohen;E.E.Haller;W.L.Hansen;A.Y.Liu;I.C.Wu https://doi.org/10.1103/PhysRevB.49.5034
  10. Surf. Corf. Technol. v.54 no.55 Growth and characterization of C-N thin films M.Y.Chen;X.Lin;V.P.Dravid;Y.W.Chung;M.S.Wong;W.D.Sproul https://doi.org/10.1016/S0257-8972(07)80048-X
  11. 전기전자재료학회논문지 v.15 no.2 반응성 스퍼터링으로 성장된 결정성 질화탄소막의 기계적 특성 이성필;강종봉 https://doi.org/10.4313/JKEM.2002.15.2.147
  12. Solid State Commun. v.65 Structural and optical properties of amorphous carbon nitride H.Han;B.J.Feldman https://doi.org/10.1016/0038-1098(88)90732-6
  13. Solid State Commun. v.103 no.3 X-ray diffraction analysis on the RF-CVD deposisted carbon nitride films D.W.Wu;W.Fan;H.X.Guo;M.B.He;X.Q.Meng;X.J.Fan https://doi.org/10.1016/S0038-1098(97)00158-0
  14. Appl. Surf. Sci v.109 no.110 Carbon nitride films preparcd by excimer laser ablation P.Gonzalez;R.Soto;E.G.Parada;X.Redondas;S.Chiussi;J.Serra;J.Pou;B.Leon;M.Perez-Amor https://doi.org/10.1016/S0169-4332(96)00754-4
  15. Thin solid Films v.280 Effects of substrate of reactive pulsed laser deposited $CN_x$films C.W.Ong;X.A.Zhao;Y.C.Tsang;C.L.Choy;P.W.Chan https://doi.org/10.1016/0040-6090(96)00853-X
  16. 전기전자재료학회논문지 v.15 no.6 고전압 방전 플라즈마에 의한 질화탄소막 증착시 플라즈마 영역에 가한 레이저 에블레이션의 효과 김종일
  17. 전기전자재료학회논문지 v.14 no.10 결정성 질화탄소 박막의 합성과 그 특성해석 김종일;배선기
  18. J. Mater. Sci. Lett v.17 Polycrystalline carbon nitride $β-C_3N_4$ films synthesized by radio frequency magnetron sputtering Y.A.Li;S.Su;H.S.Li;W.Y.Luo https://doi.org/10.1023/A:1006585422729
  19. Materials Letters v.22 Formation of the crystalline $β-C_3N_4$ phasc by dual ion beam sputtering deposition J.P.Riviere;D.Texier;J.delafond;M.Jaonen;E.L.Mathe J.Chanmont https://doi.org/10.1016/0167-577X(94)00233-9
  20. Philosophical Magazine Letters v.81 Fourier transform infrarcd and Raman spcctroscopy studies on a and $β C_3N_4$ films Y.Zhang;Y.Gu https://doi.org/10.1080/09500830110051809
  21. Thin Solid Films v.332 Propertics of carbon nitride films dcposited by magnatron sputtering Y.Kusano;J.E.Evetts;R.E.Somekh;I.M.Hutchings https://doi.org/10.1016/S0040-6090(98)00983-3