Effective electron mobility in Si inversion in metal-oxide-semiconductor systems with a high-k insulator: The role of remote phonon scattering

  • Fischetti, Massimo V. (IBM Research Division, Thomas J. Watson Research Center) ;
  • Neumayers, Deborrah A. (IBM Research Division, Thomas J. Watson Research Center) ;
  • Caritier, Eduard A. (IBM Research Division, Thomas J. Watson Research Center)
  • Published : 2003.09.01

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