Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of Novel Thin Film Diode with Multi-step Anodic Oxidation and Post Heat-treatment

  • Hong, Sung-Jei (Information Display Research Center, Korea Electronics Technology Institute) ;
  • Lee, Chan-Jae (Information Display Research Center, Korea Electronics Technology Institute) ;
  • Moon, Dae-Gyu (Information Display Research Center, Korea Electronics Technology Institute) ;
  • Kim, Won-Keun (Information Display Research Center, Korea Electronics Technology Institute) ;
  • Han, Jeong-In (Information Display Research Center, Korea Electronics Technology Institute)
  • Published : 2002.12.01
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Abstract

Thin film diode with reliable interfacial structure was fabricated by using multi-step anodic oxidation. The thickness of the oxide layer was preciously controlled with anodic voltage. Also, interfacial structure between oxide layer and top electrode was improved by applying post heat-treatment. The thin film diode showed symmetric and stable I-V characteristics after the post heat-treatment.

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References

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