참고문헌
- Economou, D. J., 2000, 'Modeling and Simulation of Plasma Etching Reactors for Microelectronics,' Thin Solid Films, Vol. 365, pp. 348-367 https://doi.org/10.1016/S0040-6090(99)01056-1
- Nanbu, K., 1996, 'Stochastic Solution Method of the Boltzmann Equation Ⅱ. Simple Gas, Gas Mixture, Diatomic Gas, Reactive Gas, and Plasma,' Rep. of the Institute of Fluid Science, Tohoku Univ., Sendai, Japan, Vol. 8, pp. 77-125
- Nanbu, K., Morimoto, T., and Suetani, M., 1999, 'Direct Simulation Monte Carlo Analysis of Flows and Etch Rate in an Inductively Coupled Plasma Reactor,' IEEE Trans. Plasma Sci., Vol. 27, No. 5, pp. 1379-1388 https://doi.org/10.1109/27.799816
- Font, G. I. and Boyd, I. D., 1997, 'Numerical Study of the Effects of Reactor Geometry on a Chlorine Plasma Helicon Etch Reactor,' J. Vac. Sci. Technol. A, Vol. 15, No. 2, pp. 313-319 https://doi.org/10.1116/1.580486
- Font, G. I., Boyd, I. D., and Balakrishnan, J., 1998, 'Effects of Wall Recombination on the Etch Rate and Plasma Composition of an Etch Reactor,' J. Vac. Sci. Technol. A, Vol. 16, No. 4, pp. 2057-2064 https://doi.org/10.1116/1.581310
-
Serikov, V. V., Kurisawa, S., and Nanbu, K., 1996, 'Profile of Al Etch Rate Estimated from the Analysis of 3-D Rarefied Flow of
$Cl_2,\;BCl_3,\;and\;AlCl_3$ in a Commerical Etcher,' Vacuum, Vol. 47, No. 6-8, pp. 1027-1029 https://doi.org/10.1016/0042-207X(96)00117-0 - Bird, G. A., 1994, Molecular Gas Dynamics and the Direct Simulation of Gas Flows, Clarendon Press, Oxford
- Hwang, Y. K. and Heo, J. S., 2002, 'Performance Analysis of a Linear Micro-Actuator Operated by Radiometric Phenomena in Rarefied Gas Flow Field,' Trans. KSME B, Vol. 26, No. 10, pp. 000-000
- Birdsall, C. K., 1991, 'Particle-in-Cell Charged-Particle Simulations, Plus Monte Carlo Collisions with Neutral Atoms, PIC-MCC,' IEEE Trans. Plasma Sci., Vol. 19, No. 2, pp. 65-85 https://doi.org/10.1109/27.106800
- Economou, D. J., Bartel, T. J., Wise, R. S., Lymberopoulos, D. P., 1995, 'Two-Dimensional Direct Simulation Monte Carlo (DSMC) of Reactive Neutral and Ion Flow in a High Density Plasma Reactor,' IEEE Trans. Plasma Sci., Vol. 23, No. 4, pp. 581-590 https://doi.org/10.1109/27.467978