Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 32 Issue 3
- /
- Pages.257-264
- /
- 1999
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
THE EFFECT OF AN APPLIED BIAS UPON THE REFLECTANCE AND ADHESION OF SILVER FILMS BEING SPUTTER-DEPOSITED ON POLYESTER SUBSTRATE
- Ri, Eui-Jae (KITech (SaengGiUeon)) ;
- Hoang, Tae-Su (KITech (SaengGiUeon))
- Published : 1999.06.01
Abstract
Thin reflective films are synthesized by using PVD methods with a bright metal of Al or Ag. For purposes of improving the reflectance and adhesion of such films particularly, substrate bias was applied during sputtering (namely, ion-plating) to enhance the deposition process with higher energy. And we succeeded in fabricating a quality silver film which possesses an adhesion of