Structural and Electrical Properties of RaRuO$_3$ Thin Film for Electrode of Ferroelectric Capacitors

강유전체 캐패시터 전극으로의 BaRuO$_3$박막의 구조적 및 전기적 특성

  • 박봉태 (고려대학교 전기, 전자, 전파공학과) ;
  • 구상모 (고려대학교 전기, 전자, 전파공학과) ;
  • 문병무 (고려대학교 전기, 전자, 전파공학과)
  • Published : 1999.01.01

Abstract

Highly conductive oxide films of BaRuO$_3$ have been grown heteroepitaxially on (100) LaAlO$_3$ single crystalline substrates by using pulsed laser deposition. The films are c-axis oriented with an in-plane epitaxial relationship of <010><100>BaRuO$_3$ // <110>LaAlO$_3$. Atomic force microscopy (AFM) observation shows that they consist of a fine-arranged network of grains and have a mosaic microstructure. Generally temperature-dependent resistivity shows the transition from metallic curve to semiconductor-metallic twofold curve by the deposition conditions for Ru oxide based materials like SrRuO$_3$, CaRuO$_3$, BaRuO$_3$, etc.. This twofold curve comes from the structural similarity of Ru oxide based materials including BaRuO$_3$. We find that the distance of Ru-Ru bonding in the unit cell of BaRuO$_3$ as well as the grain boundary scattering could be the two important causes of these interesting conductive properties.

Keywords

References

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