Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Layer-by-layer Deposition of BSCCO Thin Films Using Ion Beam Sputtering Method

이온 빔 스퍼터법에 의한 BSCCO 박막의 순차 증착

  • 박용필 (동신대학교 공대 전기전자공학과) ;
  • 이준웅 (광운대학교 공대 전기공학과(신기술연구소))
  • Published : 1998.04.01
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Abstract

$Bi_2Sr_2CuO_x$(Bi-2201) thin films have been fabricated by atomic layer-by-layer deposition using ion beam sputtering (IBS) method. During the deposition, 14 wt%-ozone/oxygen mixture gas of typical pressure of $5.0\times10^{-5}$ Torr is supplied with ultraviolent light irradiation for oxidation. XRD and RHEED investigations reveal that a buffer layer with compositions different from Bi-2201 is formed at the early deposition stage of less than 10 units cell and then Bi-2201 oriented along the c-axis is grown.

Keywords

References

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