References
- Electron Letters v.15 Amorphous Silicon Field Effect Device and Possible Application P. G. Le Comber;W.E. Spear;A.Ghaith
- SID '94 Digest A Very Small Ploy-Si TFT-LCD for HDTV Projectors T. Yamashita;T. Matsumoto;Shimada;Y. Akebi;M. Kubo;K. Fujioka
- SID'94 Digest 1.3-in. Full-Color VGA Poly-Si TFT-LCDs with Completely Integrated Drivers M. Matsuo;T. Hashizume;S. Inoue;M. Miyasaka;S. Takenaka;H. Ohshima
- Appl. Phys. Lett. v.65 Polycrystalline Silicon Thin Film Transistors Deposited at Low Substrate Temperature by Remote Plasma Chemical Vapor Deposition Using SiF₄/H₂ J.I. Woo;H.J. Ihm;J. Jang
- 한국재료학회지 v.5 no.2 Characteristics of Low-Temperature Polysilicon Thin Film Transistors Y.H. Kim
- SID'94 Digest Advances in Liquid Crystals for TFT Displays R. Tarao;H. Saito;S. Sawada;Y. Goto
- Electrochemical Society Fall Meeting, Oct. Characteristics of TFTs Fabricated from Polycrystalline UHV/CVD Si and Ge-Si Films T.Y. Ma;M. Racanelli;D.W. Greve
- 대한전자공학회논문지 v.28 no.2 Fabrication and Characteristics of Low Temperature Polycrystal Silicon Thin Film Transistors for Displays T.Y. Ma;K.C. Park;S.H. Kim
- Japan Display '92 Future of Amorphous Si TFTs and Their Fabrication Technologies N. Ibaraki
- Jpn J. Appl. Phys. v.28 no.4 Polycrystalline Silicon Film Formation at Low Temperature Using a Microcrystalline Silicon Film K. Nakazawa;K. Tanaka;N. Yamauchi
- J. Appl. Phys. v.65 no.5 Crystallized Si Films by Low-Temperature Rapid Thermal Annealing of Amorphous Silicon R. Kakkad;J. Smith;W.S. Lau;S.J. Fonash
- 1st TFT LCD international workshop SNU, Jan. Metal Induced Lateral Crystallization of Amorphous Silicon Films S.K. Joo;S.W. Lee
- Korean Appl. Phys. v.7 no.1 RF전력과 수소희석이 RP-CVD에 의한 저온 다결정 실리콘의 특성에 미치는 영향 김성기;박규창;황명학;장진
- 한국재료학회지 v.6 no.4 기계적 damage 활성화효과에 대한 수소화 및 비수소화 비정질규소박막의 고상결정화 거동 김형택;김영관