A study on the off-current mechanism of poly-Si thin film transistors fabricated at low temperature

저온 제작 다결정 실리콘 박막 트랜지스터의 off-current메카니즘에 관한 연구

  • 진교원 (수원대학교 전자재료공학과) ;
  • 김진 (수원대학교 전자재료공학과) ;
  • 이진민 (수원대학교 전자재료공학과) ;
  • 김동진 (수원대학교 전자재료공학과) ;
  • 조봉희 (유한공업전문대학 전자과) ;
  • 김영호 (수원대학교 전기공학과)
  • Published : 1996.12.01

Abstract

The conduction mechanisms of the off-current in low temperature (.leq. >$600^{\circ}C$) processed polycrystalline silicon thin film transistors (LTP poly-Si TFT'S) have been systematically studied. Especially, the temperature and bias dependence of the off-current between hydrogenated and nonhydrogenated poly-Si TFT's were investigated and compared. The off-current of nonhydrogenated poly-Si TF's is because of a resistive current at low gate and drain voltage, thermally activated current at high gate and low drain voltage, and Poole-Frenkel emission current in the depletion region near the drain at high gate and drain voltage. After hydrogenation it has shown that the off -current mechanism is caused mainly by thermal activation and that the field-induced current component is suppressed.

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