Zinc-acetate 직접 가열에 의한 ZnO막의 제조 및 산소분위기 영향

Fabrication of ZnO films from directly heated Zinc-Acetate and oxygen effects on the deposition

  • 마대영 (경상대학교 전기공학과) ;
  • 이수철 (경상대학교 전기공학과) ;
  • 김상현 (경상대학교 전기공학과) ;
  • 박기철 (경상대학교 전자재료공학과) ;
  • 김기완 (경북대학교 전자공학과)
  • 발행 : 1995.07.01

초록

ZnO films have been grown easily with the conventional thermal evaporation method on SiO$\_$2/ coated Si wafers. Anhydrous zinc acetate has been used as evaporation source. Zinc-acetate was directly heated in the laboratory-made brass boat. Zinc-acetate was sublimed at the boat temperature of about 220.deg. C. The substrates were heated to 600.deg. C with home made tantalium heater. Oxygen has been flowed into the deposition chamber to change the partial pressure of oxygen. X-ray diffraction patterns showed all the films to be amorphous. The films deposited at high oxygen pressure exhibit higher resistivity than films at low pressure. Energy dispersive spectroscopy(EDS) and rutherford backscattering spectrometry(RBS) were conducted on the films to reveal the composition of the ZnO films.

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