참고문헌
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- J. Vac. Sci. Technol. v.A7 no.5 Plasma-Assisted Chemical Vapor Deposition of Titanium Nitride in a Capacitively Coupled Radio-Frequency Dischsarge J. Laimer;H. Stori
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- J. Vac. Sci. Technol. v.A4 no.6 Titanium aluminum nitride films: A new alternative to TiN coatings W.D. Munz
- J. Appl. Phys. v.67 no.3 Oxidation of metastable singlephase polycrystalline TiAln films D Mclntyre;J.E. Greene;G. Hakansson;J.E. Sundgren;W.D. Munz
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- J. Vac. Sci. Technol v.A12 no.4 (Ti₁-xAlx)N coatings by plasma-enhanced chemical vapor deposition S.H. Lee;H.J. Ryoo;J.J. Lee
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- J. Vac. Sci. Technol. v.A9 no.4 The effects of chlorine content on the properties of titanium carbonitride thin film deposited by plasma-assisted chemical vapor deposition S.B. Kim;S. Choi;S.S. Chun;K.H. Kim
- Thin Solid Films Comparative studies of TiN and Ti₁-xAlxN by plasma-assisted chemical vapor deposition using a TiCl₄/AICI₃/N₂/Ar/H₂gas mixture K.H. Kim;S.H. Lee