Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)
- Volume 31A Issue 12
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- Pages.115-121
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- 1994
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- 1016-135X(pISSN)
Spiking characteristics of the CVD aluminum plugged on silicon direct contacts
알루미늄/실리콘 직접 접촉창에 증착된 화학 증착 알루미늄의 스파이킹 특성
Abstract
Aluminum films were chemically vapor deposited for the metallization of the integrated circuits and the spiking characteristics of the direct CVD Al/Si contacts were investigated. When the aluminum was formed by CVD uniform consumption of the substrate silicon was observed, which is quite different from the phenomena observed in sprttered Al. Silicon consumption occured during the deposition of CVD Al and the erosion depth of the silicon was several hundred
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