Journal of the Korean Graphic Arts Communication Society (한국인쇄학회지)
- Volume 12 Issue 1
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- Pages.47-65
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- 1994
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- 1226-1149(pISSN)
A Study on the Application of a Developing Condition for the Monobath
Monobath 의 처리조건에 대한 실용성 연구
Abstract
Synthetic photoresist have partially displaced the natural materials, but bichromated casein have remained in use until recently at etching industry such as chemical milling. The object of this paper is that the mutual relations among factors and suitable latitude in pattern formation or etching process when is to be applied the casein ammonium bichromate photoresist.
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