The basic study on the surface treatment of aluminum substract for lithography

평판인쇄용 Aluminum지지체의 표면처리에 관한 기초연구

Recently, the photopolymer made of novolak resin as the base and the naphthoquinonediazide(NQD) as the photoreactive compound is used for the presensitized plate(PS plate). The reaction mechanism of the NQD-novolak resin on light exposure is considered. Upon exposure it undergoes a Wolff rearrangement, via ketene intermediate which react with water ti form an 3-indene carboxylic acid. It was also found that NQD type resin in this experiment shows a high relative sensitivity compared with imported sample from Japan.