Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2012.02a
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- Pages.382-382
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- 2012
Effect of the Substrate Temperature on the Characteristics of CIGS Thin Films by RF Magnetron Sputtering Using a $Cu(In_{1-x}Ga_x)Se_2$ Single Target
- Jung, Sung-Hee (Department of Chemical Engineering, Inha University) ;
- Kong, Seon-Mi (Department of Chemical Engineering, Inha University) ;
- Fan, Rong (Department of Chemical Engineering, Inha University) ;
- Chung, Chee-Won (Department of Chemical Engineering, Inha University)
- Published : 2012.02.08
Abstract
CIGS thin films have received great attention as a promising material for solar cells due to their high absorption coefficient, appropriate bandgap, long-term stability, and low cost production. CIGS thin films are deposited by various methods such as co-evaporation, sputtering, spray pyrolysis and electro-deposition. The deposition technique is one of the most important processes in preparing CIGS thin film solar cells. Among these methods, co-evaporation is one of the best technique for obtaining high quality and stoichiometric CIGS films. However, co-evaporation method is known to be unsuitable for commercialization. The sputtering is known to be very effective and feasible process for mass production. In this study, CIGS thin films have prepared by rf magnetron sputtering using a