Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Study of FFF with Optically-Controlled Microwave Pulses in Non-uniform Plasma Layer

  • Wang, Xue (Division of Electrical Electronic & Information Engineering, Wonkwang University) ;
  • Seo, Dong-Ho (Division of Electrical Electronic & Information Engineering, Wonkwang University) ;
  • Kim, Yong-K. (Division of Electrical Electronic & Information Engineering, Wonkwang University)
  • Published : 2009.06.18
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Abstract

In this paper we study on the semiconductor characteristic by calculating the variation of reflection function in microstrip lines, which has open-ended termination containing an optically induced plasma region. The variation of impedances resulting from the presence of plasma has evaluated with time and frequency domain. The responses have been also evaluated theoretically for changing the phase of the variation in the reflection.

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