Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2009.06a
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- Pages.65-66
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- 2009
A Study on SU-8 Fabrication Process for RF and Microwave Application
RF 및 Microwave 응용을 위한 SU-8 공정 연구
- Wang, Cong (Kwangwoon Univ.) ;
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Kim, Nam-Young
(Kwangwoon Univ.)
- Published : 2009.06.18
Abstract
This paper describes a procedure developed to fabricate negative photo resist SUMS to a semi-insulating (SI)-GaAs-based substrate. SU-8 is attractive for micromachine multi-layer circuit fabrication, because it is photo-polymerizable resin, leading to safe, and economical processing. This work demonstrates SUMS photo resist can be used for RFIC/MMIC application.