한국재료학회:학술대회논문집 (Proceedings of the Materials Research Society of Korea Conference)
- 한국재료학회 2007년도 추계학술발표대회 및
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- Pages.15.1-15.1
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- 2007
Atomic layer deposition of $Ti_2O$ thin films using $NH_3$ gas as a non-oxidizing reactant gas.
- 발행 : 2007.11.02