The enhanced nucleation behavior of atomic-layer-deposited Ru film on porous low-k dielectrics by $UV-O_3$ treatment

  • Heo, Jae-Yeong (School of Materials Science & Engineering, Seoul National University) ;
  • Lee, Sang-Young (School of Materials Science & Engineering, Seoul National University) ;
  • Eom, Da-Il (School of Materials Science & Engineering, Seoul National University) ;
  • Park, Sang-Hyun (School of Materials Science & Engineering, Seoul National University) ;
  • Hwang, Cheol-Seong (School of Materials Science & Engineering, Seoul National University) ;
  • Kim, Hyeong-Joon (School of Materials Science & Engineering, Seoul National University)
  • Published : 2007.11.16