An investigation of ultra low dielectric constant SiOC(-H) thin films for interconnect technology;Understanding the requirements

  • Navamatbavan, R. (Nano Thin Film Materials Laboratory, Department of Physics) ;
  • Lee, Heon-Ju (Department of Mechanical, Energy and Production Engineering) ;
  • Lee, Kwang-Man (Faculty of Electrical and Electronics Engineering, Cheju National University) ;
  • Choi, Chi-Kyu (Nano Thin Film Materials Laboratory, Department of Physics)
  • 발행 : 2007.08.15